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Plasma-enabled growth of vertically oriented carbon nanostructures for AC line filtering capacitors [Elektronski vir]Bundaleska, N. ...Self-standing vertically oriented carbon nanostructures (VCNs) were synthesized using a large-scale microwave plasma under low-pressure conditions, employing methane as a carbon precursor. The ... influence of plasma operational and substrate conditions on nanostructure growth and morphology were systematically studied. Furthermore, post-synthesis N-doping of VCNs with nitrogen content of 2.4 at% N was achieved using an Ar-N2 microwave plasma. Plasma-enabled direct deposition of VCNs, both doped and un-doped, onto nickel foils has been accomplished. The assessment of the developed nanostructures as electrodes in high-frequency AC filtering capacitors, has demonstrated an overall capacitance of approximately 480 µF at 100 Hz, with a cut-off frequency of 4 kHz for a phase angle of −45°. The excellent electrochemical performance can be attributed to the appropriate structural and morphological properties peculiar for the directly deposited on nickel foil VCNs providing binder-free electrode fabrication, thus enhancing the electrode’s conductivity and charge transfer kinetics. This plasma-enabled approach for electrode design on a large scale, coupled with excellent filtering performance, paves the way for many applications in high-frequency scenarios, offering an environmentally friendly alternative to conventional electrolytic capacitors.Source: Applied surface science [Elektronski vir]. - ISSN 1873-5584 (
, [article no.] 161002, 2024, 1-29 str.) Type of material - e-article ; adult, seriousPublish date - 2024Language - englishCOBISS.SI-ID - 204684291
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Database name | Field | Year |
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Links to authors' personal bibliographies | Links to information on researchers in the SICRIS system |
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Bundaleska, N. | |
Felizardo, M.E. | |
Santhosh, Neelakandan Marath | 55438 |
Zavašnik, Janez, 1981- | 33329 |
Cvelbar, Uroš, 1975- | 22289 |
Tatarova, Elena |
Source: Personal bibliographies
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