Jožef Stefan Institute, Lj. (IJS)
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A Comparative study of Ni/Si interaction by means of XRD, RBS, AES and electrical resistivityCvelbar, Andrej ...Tri različne vrste napršenih tankoplastnih struktur Ni/Si smo izpostavili povišani temperaturi in istočasno merili njihovo električno upornost. Po termični obdelavi smo vzorce preiskali z XRD, RBS in ... AES ter rezultate med seboj primerjali in obrazložili.Source: Proceedings (Str. 177-182)Type of material - conference contributionPublish date - 1994Language - englishCOBISS.SI-ID - 10466
Author
Cvelbar, Andrej |
Panjan, Peter |
Pelicon, Primož |
Navinšek, Boris |
Zalar, Anton |
Budnar, Miloš |
Mandrino, Đorđe
Topics
tanka plasti |
fazne meje |
reakcije v trdni snovi |
nikljevi silicidi |
XRD |
AES |
RBS |
električna upornost
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JCR | SNIP | JCR | SNIP | JCR | SNIP | JCR | SNIP |
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DRS, in which the journal is indexed
Database name | Field | Year |
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Links to authors' personal bibliographies | Links to information on researchers in the SICRIS system |
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Cvelbar, Andrej | 11370 |
Panjan, Peter | 09090 |
Pelicon, Primož | 12314 |
Navinšek, Boris | 00085 |
Zalar, Anton | 01741 |
Source: Personal bibliographies
and: SICRIS
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