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  • Spin-on-glass material curing and etching
    Osredkar, Radko
    Successful development of a spin-on-glass (SOG) planarization proces requires a detailed knowledge of the processing parameters of SOG materials, as they are extremely sensitive to processing ... conditions and equipment. Baking and etching parameters of these materials have been investigated in some detail; the amount of film thickness reduction during curing was determined and etching parameters for the SOG-PECVD oxide bilayer investigated.
    Vir: Microelectronics and reliability. - ISSN 0026-2714 (Vol. 34, No. 7, 1994, str. 1265-1267)
    Vrsta gradiva - članek, sestavni del
    Leto - 1994
    Jezik - angleški
    COBISS.SI-ID - 3254550