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Knjižnica IMT
  • AES and XPS of thin oxide layers on metallic surfaces = Spektroskopija Augerjevih elektronov in rentgenska fotoelektronska spektroskopija tankih oksidnih plasti na kovinskih površinah
    Mandrino, Djordje ; Donik, Črtomir ; Jenko, Monika, 1947-
    Thin oxide films produced by exposures of metallic surfaces to UHV and controlled HV oxygen atmospheres were studied by using AES and XPS. The lowest exposures produced only adsorbed oxygen layers ... while exposures of several tens of Langmuirs at 10[sup]{-5} mb oxygen yielded oxide layers of several nanometers. Different types of metallic substrates were used, such as iron, chromium and duplex stainless steel. AES and XPS profiling analysis were performed. An attempt was made to correlate certain features in AES spectra, such as LMM peak intensities and MNN peak shapes of metals to the chemical state of the corresponding element. Similar approach has been tried before and may, combined with high lateral resolution AES, provide small area chemical state information. Localized chemical state information derived from MNN peak shapes seems to be in agreement with the one provided by XPS which is averaged over approximately 2 mm[sup]2. This is not unreasonable for thin homogeneous layer on polished substrate.
    Vir: Program in knjiga povzetkov = Program and book of abstracts (str. 78)
    Vrsta gradiva - prispevek na konferenci
    Leto - 2008
    Jezik - angleški, slovenski
    COBISS.SI-ID - 705962

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