Akademska digitalna zbirka SLovenije - logo
Narodna in univerzitetna knjižnica, Ljubljana (NUK)
Naročanje gradiva za izposojo na dom
Naročanje gradiva za izposojo v čitalnice
Naročanje kopij člankov
Urnik dostave gradiva z oznako DS v signaturi
  • Preparation of thin coatings of titanium compounds with ion implantation = Priprava tankih prevlek titanovih spojin z ionsko implantacijo
    Mozetič, Miran, 1961- ...
    The growth of thin coatings of titanium oxide and nitride during ion implantation of respective ions into titanium substrate was studied theoretically and experimentally. The IBM SRIM software was ... used to determine the concentration profiles of implanted ions, the sputtering rate, probability of back - scattering and ion energy loss mechanisms. Theoretical results were compared with experiments. Samples of pure titanium plates were carefully polished and exposed to a flux of oxygen and nitrogen ions with the kinetic energy of 100 keV per molecule (50 keV per atom). The ion doses were 5x10[sup]16, 1x10[sup]17, 2.5x10[sup]17, 5x10[sup]17, 7.5x10[sup]17, 1x10[sup]18 atoms/cm[sup]2. Depth profiles of the samples were determined by the AES method. Both the theory and experiment showed that the ion range at the low dose was about 90 nm for the case of nitrogen, and 80 nm for the case of oxygen, with depth distribution typical for ion implantation. Experimental results showed that a layer of titanium compound with a constant composition was formed at the ion dose above 7.5x10[sup]17 atoms/cm[sup]2.
    Vir: Informacije MIDEM : časopis za mikroelektroniko, elektronske sestavne dele in materiale = časopis za mikroelektroniku, elektronske sastavne dijelove i materijale = journal of microelectronics, electronic components and materials. - ISSN 0352-9045 (Letn. 29, št. 3, sep. 1999, str. 117-120)
    Vrsta gradiva - članek, sestavni del
    Leto - 1999
    Jezik - angleški
    COBISS.SI-ID - 1726036

    Povezava(-e):

    Digitalna knjižnica Slovenije - dLib.si

Vnos na polico