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Trenutno NISTE avtorizirani za dostop do e-virov konzorcija SI. Za polni dostop se PRIJAVITE.

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zadetkov: 73
41.
Celotno besedilo
Dostopno za: NUK, UL
42.
Celotno besedilo
Dostopno za: GEOZS, IJS, IMTLJ, KILJ, KISLJ, NUK, OILJ, PNG, SAZU, SBCE, SBJE, UL, UM, UPCLJ, UPUK, VSZLJ
43.
Celotno besedilo
Dostopno za: IJS, KILJ, NUK, UL
44.
Celotno besedilo
Dostopno za: CMK, CTK, FMFMET, IJS, NUK, PNG, UM

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45.
  • 3,4-Dihalopyrroles 3,4-Dihalopyrroles
    Motekaitis, R. J; Heinert, D. H; Martell, Arthur E Journal of organic chemistry, 08/1970, Letnik: 35, Številka: 8
    Journal Article
    Recenzirano
Celotno besedilo
Dostopno za: IJS, KILJ, NUK, UL
46.
Celotno besedilo
Dostopno za: CMK, CTK, FMFMET, IJS, NUK, PNG, UM
47.
  • Potential mechanical loss mechanisms in bulk materials for future gravitational wave detectors
    Heinert, D; Grib, A; Haughian, K ... arXiv.org, 03/2010
    Paper, Journal Article
    Odprti dostop

    Low mechanical loss materials are needed to further decrease thermal noise in upcoming gravitational wave detectors. We present an analysis of the contribution of Akhieser and thermoelastic damping ...
Celotno besedilo
Dostopno za: NUK, UL, UM, UPUK
48.
  • Scientific Objectives of Einstein Telescope
    Sathyaprakash, B; Abernathy, M; Allen, B ... arXiv.org, 06/2012
    Paper, Journal Article
    Odprti dostop

    The advanced interferometer network will herald a new era in observational astronomy. There is a very strong science case to go beyond the advanced detector network and build detectors that operate ...
Celotno besedilo
Dostopno za: NUK, UL, UM, UPUK
49.
  • Investigation of mechanical losses of thin silicon flexures at low temperatures
    Nawrodt, R; Schwarz, C; Kroker, S ... arXiv.org, 03/2010
    Paper, Journal Article
    Odprti dostop

    The investigation of the mechanical loss of different silicon flexures in a temperature region from 5 to 300 K is presented. The flexures have been prepared by different fabrication techniques. A ...
Celotno besedilo
Dostopno za: NUK, UL, UM, UPUK
50.
Celotno besedilo
Dostopno za: UL

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