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zadetkov: 275
1.
  • Control of gas concentratio... Control of gas concentration distribution in a semiconductor process chamber using CT-TDLAS measurement
    Hayashi, Daisuke; Sakaguchi, Yuhei; Minami, Masakazu AIP advances, 02/2021, Letnik: 11, Številka: 2
    Journal Article
    Recenzirano
    Odprti dostop

    Methane (CH4) concentration distribution in a semiconductor process chamber was controlled using the measurement of computed tomography-tunable diode laser absorption spectroscopy (CT-TDLAS) and the ...
Celotno besedilo
Dostopno za: NUK, UL, UM, UPUK

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2.
  • Cp2Mg in-situ monitoring in... Cp2Mg in-situ monitoring in a MOVPE reactor using a quantum cascade laser
    Hayashi, Daisuke; Sato, Yoko; Minami, Masakazu ... Japanese Journal of Applied Physics, 06/2019, Letnik: 58, Številka: SC
    Journal Article
    Recenzirano
    Odprti dostop

    We performed in-situ monitoring of bis-cyclopentadienyl magnesium (Cp2Mg) vapor pressure supplied into a metal-organic vapor phase epitaxy reactor. As a light source we adopted a quantum cascade ...
Celotno besedilo
Dostopno za: NUK, UL

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3.
  • Chamber in-situ estimation ... Chamber in-situ estimation during etching process by SiF 4 monitoring using laser absorption spectroscopy
    Hada, Miyako; Takahashi, Motonobu; Sakaguchi, Yuhei ... Japanese Journal of Applied Physics, 07/2023, Letnik: 62, Številka: SI
    Journal Article
    Recenzirano

    Abstract The behavior of the partial pressure of SiF 4 , a byproduct of fluorine-based plasma etching, has been measured in real-time using a method based on Laser Absorption Spectroscopy (LAS). The ...
Celotno besedilo
Dostopno za: NUK, UL
4.
  • Chamber in-situ estimation ... Chamber in-situ estimation during etching process by SiF4 monitoring using laser absorption spectroscopy
    Hada, Miyako; Takahashi, Motonobu; Sakaguchi, Yuhei ... Japanese Journal of Applied Physics, 07/2023, Letnik: 62, Številka: SI
    Journal Article
    Recenzirano
    Odprti dostop

    The behavior of the partial pressure of SiF4, a byproduct of fluorine-based plasma etching, has been measured in real-time using a method based on Laser Absorption Spectroscopy (LAS). The partial ...
Celotno besedilo
Dostopno za: NUK, UL
5.
  • Simultaneous measurement of... Simultaneous measurement of CH4 concentration and temperature distributions in a semiconductor process chamber
    Hayashi, Daisuke; Nakai, Junya; Minami, Masakazu ... Journal of physics. D, Applied physics, 11/2019, Letnik: 52, Številka: 48
    Journal Article
    Recenzirano

    Methane (CH4) concentration and temperature distributions were measured in a semiconductor process chamber using computed tomography-tunable diode laser spectroscopy (CT-TDLAS). A semiconductor ...
Celotno besedilo
Dostopno za: NUK, UL
6.
Celotno besedilo
Dostopno za: NUK, UL
7.
  • Cp 2 Mg in-situ monitoring ... Cp 2 Mg in-situ monitoring in a MOVPE reactor using a quantum cascade laser
    Hayashi, Daisuke; Sato, Yoko; Minami, Masakazu ... Japanese Journal of Applied Physics, 06/2019, Letnik: 58, Številka: SC
    Journal Article
    Recenzirano

    Abstract We performed in-situ monitoring of bis-cyclopentadienyl magnesium (Cp 2 Mg) vapor pressure supplied into a metal-organic vapor phase epitaxy reactor. As a light source we adopted a quantum ...
Celotno besedilo
Dostopno za: NUK, UL

PDF
8.
Celotno besedilo
Dostopno za: NUK, UL, UM
9.
  • CH4 Concentration Distribution in a Semiconductor Process Chamber Measured by the CT-TDLAS
    Hayashi, Daisuke; Nakai, Junya; Minami, Masakazu ... ECS journal of solid state science and technology, 2018, Letnik: 7, Številka: 11
    Journal Article
    Recenzirano

    We measured methane (CH4) concentration distribution in a semiconductor process chamber by using the computed tomography-tunable diode laser spectroscopy (CT-TDLAS). We designed the CT-TDLAS ...
Celotno besedilo
Dostopno za: NUK, UL
10.
Celotno besedilo
Dostopno za: NUK, UL
1 2 3 4 5
zadetkov: 275

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