Polyethersulfone (PES) with a glass transition temperature of 224 °C is a class of high‐performance super engineering plastics with excellent heat resistance, as well as mechanical, electrical, and ...optical properties. However, the nanopatterning of PES using thermal nanoimprint lithography at a high temperature can induce technical difficulties. High‐accuracy 900‐nm line patterning of PES is fabricated 50 times using both a solvent‐permeable cellulose‐based mold and dimethylformamide as a dilution solvent in direct thermal nanoimprint lithography. The use of dilution solvents in PES has yet been limited in the nanoimprint lithography, and the developed processes expand the surface patterning of super engineering plastic.
High‐accuracy 900‐nm line patterning of polyethersulfone is fabricated 50 times using both a solvent‐permeable cellulose‐based mold and dimethylformamide as a dilution solvent in direct thermal nanoimprint lithography. The use of dilution solvents in polyethersulfone has yet been limited in the nanoimprint lithography, and the developed processes expand the surface patterning of super engineering plastic.
This study aims to expand the possibility of nanoimprint lithography by fabricating a high-accuracy gold (Au) nanostructure, which holds great potential in broad functional applications, using ...solvent-permeable porous cross-linking molds derived from hydroxypropyl-cyclodextrin. Multiple functional Au moth-eye nanostructures were imprinted 30 times using Au nanopaste, which involved volatile dilution solvents in the adjusted nanoimprint processes. The proposed method using solvent-permeable porous cross-link molds having high oxygen transmission rate could avoid the nanopattern failure due to the trapping of solvent and/or gas in the solvent-impermeable molds.
This paper concerns negative-tone water-soluble resists containing amylopectin and amylose derivatives for safety-oriented photolithography of edible pharmaceutical polymer films that can be used in ...drug capsules and enteric coating materials. Organic developers and solvents contained in commonly used resists cause damage and contamination between the resist and pharmaceutical polymer films in the resist coating, and during photolithographic development. An optimized resist formulation and photosensitivity led to well-patterned 450 nm lines on hydroxypropyl methylcellulose at an exposure wavelength of 360-375 nm and acceptable etch resistance to CF4 for anti-counterfeiting of pharmaceutical products.
This study aims to expand the antibacterial activity of the cross-linked film derived from oligoglucosamine by processing sharp protrusion nanostructures on the film surface in ultraviolet ...nanoimprint lithography using a solvent-permeable template. The solvent-permeable template was able to remove the dilution solvent contained in the flowable liquid derived from oligoglucosamine for life science and medical healthcare, which is the cause of molding failure, resulting in nanostructures of sharp protrusions. The nanostructured cross-linked antibacterial film derived from oligoglucosamine indicated 1.6 times the antibacterial activity compared to that of the flat comparative antibacterial film before the fabrication of the nanostructures.
Abstract There are few reports of the Oxford unicompartmental knee arthroplasty (UKA) survival rate in Asia. This study describes outcomes of 1279 Oxford UKAs for Japanese patients. The mean ...follow-up was 5.2 years. We divided patients into two groups based on preoperative indications (extended indications group and strict indications group). The Oxford knee score improved from 22.3 to 40.8 ( P = 0.041). The 10-year survival rate using revision was 95%. A total of 25 UKAs (2.0%) required revision. The most common reason was subsidence of tibial component. The 5-year cumulative survival rate of the strict indications group was significantly higher than that of the extended indications group (99.1% vs. 93.8%, P < 0.001). When we followed inclusion criteria strictly, good clinical results were achieved in Asia.
In this study, water-developable photoresist materials capable of fine patterning were developed by imparting photosensitive groups to a molecule made from hemicellulose arabinoxylan extracted from ...corn bran, which were fabricated by UV exposure at 365 nm and 45 J/cm2. The surface topography of the photoresist pattern developed with water was observed to be approximately 0.46 µm. The etching resistance was improved in the photoresist material made from hemicellulose arabinoxylan compared with other water-soluble polymers. The development of water-developable photoresist materials derived from hemicellulose is expected to reduce environmental impact. In addition to the electronics field, where photoresist materials have been used in the past, applications in the medical field and biosystems are also expected since the material is derived from biomass.
Conductive olfactory dysfunction (COD) is caused by an obstruction in the nasal cavity and is characterized by changeable olfaction. COD can occur even when the olfactory cleft is anatomically ...normal, and therefore, the cause in these cases remains unclear. Herein, we used computational fluid dynamics to examine olfactory cleft airflow with a retrospective cohort study utilizing the cone beam computed tomography scan data of COD patients. By measuring nasal-nasopharynx pressure at maximum flow, we established a cut-off value at which nasal breathing can be differentiated from combined mouth breathing in COD patients. We found that increased nasal resistance led to mouth breathing and that the velocity and flow rate in the olfactory cleft at maximum flow were significantly reduced in COD patients with nasal breathing only compared to healthy olfactory subjects. In addition, we performed a detailed analysis of common morphological abnormalities associated with concha bullosa. Our study provides novel insights into the causes of COD, and therefore, it has important implications for surgical planning of COD, sleep apnea research, assessment of adenoid hyperplasia in children, and sports respiratory physiology.
Celotno besedilo
Dostopno za:
DOBA, IZUM, KILJ, NUK, PILJ, PNG, SAZU, SIK, UILJ, UKNU, UL, UM, UPUK
Conductive olfactory dysfunction (COD) is caused by an obstruction in the nasal cavity and is characterized by changeable olfaction. COD can occur even when the olfactory cleft is anatomically ...normal, and therefore, the cause in these cases remains unclear. Herein, we used computational fluid dynamics to examine olfactory cleft airflow with a retrospective cohort study utilizing the cone beam computed tomography scan data of COD patients. By measuring nasal-nasopharynx pressure at maximum flow, we established a cut-off value at which nasal breathing can be differentiated from combined mouth breathing in COD patients. We found that increased nasal resistance led to mouth breathing and that the velocity and flow rate in the olfactory cleft at maximum flow were significantly reduced in COD patients with nasal breathing only compared to healthy olfactory subjects. In addition, we performed a detailed analysis of common morphological abnormalities associated with concha bullosa. Our study provides novel insights into the causes of COD, and therefore, it has important implications for surgical planning of COD, sleep apnea research, assessment of adenoid hyperplasia in children, and sports respiratory physiology.
Celotno besedilo
Dostopno za:
DOBA, IZUM, KILJ, NUK, PILJ, PNG, SAZU, SIK, UILJ, UKNU, UL, UM, UPUK
Dextrins commonly known as sugar chains include 1,4- and 1,6-bonded dextrins, which are obtained by enzymatically decomposing starch, and is indigestible dextrin, which is obtained by decomposing ...starch by an enzymatic reaction and forming 1,2- or 1,3-bonds by acid catalyst treatment. Herein we investigate the water-soluble micropatterning performance of these indigestible dextrins and the change in physical characteristics depending on the structure. The hydroxyl group of each dextrin was modified with a photosensitive group while maintaining water solubility, resulting in a water-soluble photosensitive material. This material was applied onto a silicon wafer using spin coating, exposed with a mask contact exposure device, and then developed with water to evaluate the sensitivity, etching resistance, and coating film strength. The microfabrication evaluation indicated that the performance was sensitive to the binding mode, and it was found that the indigestible dextrin is functional as a water-soluble micropatterning material. Given that this material does not require an organic solvent or a highly toxic strong alkaline developer, it is effective as a low environmental load patterning material.
Hydroxyl groups of dextrin, which is a base polymer, were modified with photosensitive groups to the extent that water solubility could be maintained, and water-soluble plant-derived photosensitive ...materials were created. This material can be applied to a silicon wafer using spin coating, exposed by a mask contact exposure system (LTCET-500: Litho Tech Japan), and then developed with water to enable fine processing, which is derived from plants for photolithography. It has been demonstrated that adaptation to water-soluble nanopatterning materials is possible. Since the base polymer is derived from plants and does not use organic solvents or highly toxic strong alkaline developers, it is useful as a low environmental load patterning material.
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