Nanophotonic structures have attracted attention for light trapping in solar cells with the potential to manage and direct light absorption on the nanoscale. While both randomly textured and ...nanophotonic structures have been investigated, the relationship between photocurrent and the spatial correlations of random or designed surfaces has been unclear. Here we systematically design pseudorandom arrays of nanostructures based on their power spectral density, and correlate the spatial frequencies with measured and simulated photocurrent. The integrated cell design consists of a patterned plasmonic back reflector and a nanostructured semiconductor top interface, which gives broadband and isotropic photocurrent enhancement.
We demonstrate an effective light trapping geometry for thin-film solar cells that is composed of dielectric light scattering nanocavities at the interface between the metal back contact and the ...semiconductor absorber layer. The geometry is based on resonant Mie scattering. It avoids the Ohmic losses found in metallic (plasmonic) nanopatterns, and the dielectric scatterers are well compatible with nearly all types of thin-film solar cells, including cells produced using high temperature processes. The external quantum efficiency of thin-film a-Si:H solar cells grown on top of a nanopatterned Al-doped ZnO, made using soft imprint lithography, is strongly enhanced in the 550–800 nm spectral band by the dielectric nanoscatterers. Numerical simulations are in good agreement with experimental data and show that resonant light scattering from both the AZO nanostructures and the embedded Si nanostructures are important. The results are generic and can be applied on nearly all thin-film solar cells.
Releasing the potential of advanced material properties by controlled structuring materials on sub-100-nm length scales for applications such as integrated circuits, nano-photonics, (bio-)sensors, ...lasers, optical security, etc. requires new technology to fabricate nano-patterns on large areas (from cm
to 200 mm up to display sizes) in a cost-effective manner. Conventional high-end optical lithography such as stepper/scanners is highly capital intensive and not flexible towards substrate types. Nanoimprint has had the potential for over 20 years to bring a cost-effective, flexible method for large area nano-patterning. Over the last 3–4 years, nanoimprint has made great progress towards volume production. The main accelerator has been the switch from rigid- to wafer-scale soft stamps and tool improvements for step and repeat patterning. In this paper, we discuss substrate conformal imprint lithography (SCIL), which combines nanometer resolution, low patterns distortion, and overlay alignment, traditionally reserved for rigid stamps, with the flexibility and robustness of soft stamps. This was made possible by a combination of a new soft stamp material, an inorganic resist, combined with an innovative imprint method. Finally, a volume production solution will be presented, which can pattern up to 60 wafers per hour.
Light-emitting diodes (LEDs) are driving a shift toward energy-efficient illumination. Nonetheless, modifying the emission intensities, colors and directionalities of LEDs in specific ways remains a ...challenge often tackled by incorporating secondary optical components. Metallic nanostructures supporting plasmonic resonances are an interesting alternative to this approach due to their strong light-matter interaction, which facilitates control over light emission without requiring external secondary optical components. This review discusses new methods that enhance the efficiencies of LEDs using nanostructured metals. This is an emerging field that incorporates physics, materials science, device technology and industry. First, we provide a general overview of state-of-the-art LED lighting, discussing the main characteristics required of both quantum wells and color converters to efficiently generate white light. Then, we discuss the main challenges in this field as well as the potential of metallic nanostructures to circumvent them. We review several of the most relevant demonstrations of LEDs in combination with metallic nanostructures, which have resulted in light-emitting devices with improved performance. We also highlight a few recent studies in applied plasmonics that, although exploratory and eminently fundamental, may lead to new solutions in illumination.
We present a direct experimental investigation of the thermal ordering in an artificial analogue of an asymmetric two-dimensional Ising system composed of a rectangular array of nano-fabricated ...magnetostatically interacting islands. During fabrication and below a critical thickness of the magnetic material the islands are thermally fluctuating and thus the system is able to explore its phase space. Above the critical thickness the islands freeze-in resulting in an arrested thermalized state for the array. Determining the magnetic state we demonstrate a genuine artificial two-dimensional Ising system which can be analyzed in the context of nearest neighbor interactions.
Using soft-imprint nanolithography, we demonstrate large-area application of engineered two-dimensional polarization-independent networks of silver nanowires as transparent conducting electrodes. ...These networks have high optical transmittance, low electrical sheet resistance, and at the same time function as a photonic light-trapping structure enhancing optical absorption in the absorber layer of thin-film solar cells. We study the influence of nanowire width and pitch on the network transmittance and sheet resistance, and demonstrate improved performance compared to ITO. Next, we use P3HT-PCBM organic solar cells as a model system to show the realization of nanowire network based functional devices. Using angle-resolved external quantum efficiency measurements, we demonstrate engineered light trapping by coupling to guided modes in the thin absorber layer of the solar cell. Concurrent to the direct observation of controlled light trapping we observe a reduction in photocurrent as a result of increased reflection and parasitic absorption losses; such losses can be minimized by re-optimization of the NW network geometry. Together, these results demonstrate how engineered 2D NW networks can serve as multifunctional structures that unify the functions of a transparent conductor and a light trapping structure. These results are generic and can be applied to any type of optoelectronic device.
By structuring a luminescent dielectric interface as a relief diffraction grating with nanoscale features, it is possible to control the intensity and direction of the emitted light. The composite ...structure of the grating is based on a fluorescent dye (Lumogen F RED 305) dispersed in a polymeric matrix (poly(methyl methacrylate)). Measurements demonstrate a significant enhancement of the emitted light for specific directions and wavelengths when the grating interface is compared to nonstructured thin films made of the same material. In particular, the maximum enhancement of photoluminescence for a given pump wavelength is obtained at an angle of incidence that is close to the Rayleigh anomaly condition for the first-order diffracted waves. In this condition, the maximum extinction of incident light is observed. Upon excitation with coherent and monochromatic sources, photoluminescence plots show that the Rayleigh anomalies confine the angular interval of the emitted light. Being the anomalies directly related to the pitch of the diffraction grating, the system can be thus implemented as an optical device whose directional emission can be designed for specific applications. The exploitation of nanoimprinting techniques for the fabrication of the luminescent grating enables production of the device on large areas, paving the way for low-cost lighting and solar applications.
A generic process has been developed to grow nearly defect-free arrays of (heterostructured) InP and GaP nanowires. Soft nano-imprint lithography has been used to pattern gold particle arrays on full ...2 inch substrates. After lift-off organic residues remain on the surface, which induce the growth of additional undesired nanowires. We show that cleaning of the samples before growth with piranha solution in combination with a thermal anneal at 550 degrees C for InP and 700 degrees C for GaP results in uniform nanowire arrays with 1% variation in nanowire length, and without undesired extra nanowires. Our chemical cleaning procedure is applicable to other lithographic techniques such as e-beam lithography, and therefore represents a generic process.