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zadetkov: 4.143
1.
  • Emerging role of interleuki... Emerging role of interleukin‐31 and interleukin‐31 receptor in pruritus in atopic dermatitis
    Furue, M.; Yamamura, K.; Kido‐Nakahara, M. ... Allergy (Copenhagen), January 2018, Letnik: 73, Številka: 1
    Journal Article
    Recenzirano
    Odprti dostop

    Atopic dermatitis (AD) is a chronic or chronically relapsing, eczematous, severely pruritic skin disorder associated with skin barrier dysfunction. The lesional skin of AD exhibits T helper 2 ...
Celotno besedilo
Dostopno za: BFBNIB, FZAB, GIS, IJS, KILJ, NLZOH, NUK, OILJ, SBCE, SBMB, UL, UM, UPUK

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2.
  • Place-Based Community Engag... Place-Based Community Engagement in Higher Education
    Yamamura, Erica K.; Koth, Kent 2018, 2023-07-03, 2018-06-30
    eBook

    While an increasing number of universities have or are committed to engaging their campuses in their surrounding communities, many recognize they lack the strategic focus and resources to maximize ...
Celotno besedilo
Dostopno za: NUK, UL, UM, UPUK
3.
  • Economic and Demographic Ch... Economic and Demographic Change in Preindustrial Japan, 1600-1868
    Hanley, Susan B; Yamamura, Kozo 2015, 2015., 20150308, 1978, Letnik: 1484
    eBook

    According to the Marxist interpretation still dominant in Japanese studies, the last century and a half of the Tokugawa period was a time of economic and demographic stagnation. Professors Hanley and ...
Celotno besedilo
Dostopno za: NUK, UL
4.
  • Atomic-scale flattening mec... Atomic-scale flattening mechanism of 4H-SiC (0001) in plasma assisted polishing
    Deng, H.; Yamamura, K. CIRP annals, 2013, 2013-00-00, 20130101, Letnik: 62, Številka: 1
    Journal Article
    Recenzirano

    Plasma assisted polishing (PAP), in which the irradiation of atmospheric pressure water vapor plasma and ceria (CeO2) abrasive polishing are combined, is a novel finishing technique for ...
Celotno besedilo
Dostopno za: GEOZS, IJS, IMTLJ, KILJ, KISLJ, NUK, OILJ, PNG, SAZU, SBCE, SBJE, UL, UM, UPCLJ, UPUK
5.
  • Plasma-assisted polishing o... Plasma-assisted polishing of gallium nitride to obtain a pit-free and atomically flat surface
    Deng, H.; Endo, K.; Yamamura, K. CIRP annals, 2015, 2015-00-00, Letnik: 64, Številka: 1
    Journal Article
    Recenzirano
    Odprti dostop

    Plasma-assisted polishing (PAP), which combines plasma modification and soft abrasive polishing, was used to flatten GaN. After the irradiation of CF4 plasma, GaN was modified to GaF3, greatly ...
Celotno besedilo
Dostopno za: GEOZS, IJS, IMTLJ, KILJ, KISLJ, NUK, OILJ, PNG, SAZU, SBCE, SBJE, UL, UM, UPCLJ, UPUK

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6.
  • Plasma assisted polishing o... Plasma assisted polishing of single crystal SiC for obtaining atomically flat strain-free surface
    Yamamura, K.; Takiguchi, T.; Ueda, M. ... CIRP annals, 2011, 2011-00-00, Letnik: 60, Številka: 1
    Journal Article, Conference Proceeding
    Recenzirano

    A novel polishing technique combined with the irradiation of atmospheric pressure plasma was proposed for the finishing of a silicon carbide material. The irradiation of helium-based water vapor ...
Celotno besedilo
Dostopno za: GEOZS, IJS, IMTLJ, KILJ, KISLJ, NUK, OILJ, PNG, SAZU, SBCE, SBJE, UL, UM, UPCLJ, UPUK
7.
  • Damage-free highly efficien... Damage-free highly efficient polishing of single-crystal diamond wafer by plasma-assisted polishing
    Yamamura, K.; Emori, K.; Sun, R. ... CIRP annals, 2018, 2018-00-00, Letnik: 67, Številka: 1
    Journal Article
    Recenzirano
    Odprti dostop

    Single-crystal diamond (SCD) is considered to be an ideal material for next-generation power devices. Plasma-assisted polishing (PAP) without using an abrasive was applied to polish SCD fabricated by ...
Celotno besedilo
Dostopno za: GEOZS, IJS, IMTLJ, KILJ, KISLJ, NUK, OILJ, PNG, SAZU, SBCE, SBJE, UL, UM, UPCLJ, UPUK
8.
Celotno besedilo
Dostopno za: BFBNIB, FZAB, GIS, IJS, KILJ, NLZOH, NUK, OILJ, SBCE, SBMB, UL, UM, UPUK
9.
  • Optimization of the plasma ... Optimization of the plasma oxidation and abrasive polishing processes in plasma-assisted polishing for highly effective planarization of 4H-SiC
    Deng, H.; Monna, K.; Tabata, T. ... CIRP annals, 2014, 2014-00-00, Letnik: 63, Številka: 1
    Journal Article
    Recenzirano
    Odprti dostop

    For the finishing of difficult-to-machine materials, plasma-assisted polishing (PAP), which combines modification by water vapor plasma and polishing by a soft abrasive, was proposed. Optimization of ...
Celotno besedilo
Dostopno za: GEOZS, IJS, IMTLJ, KILJ, KISLJ, NUK, OILJ, PNG, SAZU, SBCE, SBJE, UL, UM, UPCLJ, UPUK

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10.
  • Too much stuff: capitalism ... Too much stuff: capitalism in crisis
    Yamamura, Kozo 03/2017
    eBook

    Where has capitalism gone wrong? Why are advanced capitalist economies so sick and why do conventional policy solutions, such as reduced taxes and increased money supply, produce only wider income ...
Celotno besedilo
Dostopno za: NUK, UL, UM
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zadetkov: 4.143

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