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zadetkov: 40
1.
  • Automatic calibration of li... Automatic calibration of lithography simulation parameters using multiple data sets
    Byers, Jeffrey; Mack, Chris; Huang, Richard ... Microelectronic engineering, 07/2002, Letnik: 61
    Journal Article, Conference Proceeding
    Recenzirano

    In this paper a systematic approach to calibrating resist parameters will be provided. The calibration procedure couples nonlinear least squares fitting algorithms with a lithography simulator to ...
Celotno besedilo
Dostopno za: GEOZS, IJS, IMTLJ, KILJ, KISLJ, NUK, OILJ, PNG, SAZU, SBCE, SBJE, UL, UM, UPCLJ, UPUK
2.
  • Data analysis for photolith... Data analysis for photolithography
    Mack, Chris A.; Legband, Dale A.; Jug, Sven Microelectronic engineering, 1999, Letnik: 46, Številka: 1
    Journal Article, Conference Proceeding
    Recenzirano

    This paper will propose standard methodologies for analyzing common lithographic data in three areas: photoresist contrast curves, swing curves, and focus-exposure matrices. For each data type, ...
Celotno besedilo
Dostopno za: IJS, IMTLJ, KILJ, KISLJ, NUK, SAZU, SBCE, SBJE, UL, UM, UPCLJ, UPUK
3.
  • Sensation seeking in Sloven... Sensation seeking in Slovenian female and male mountain climbers
    Burnik, S; Jug, S; Kajtna, T Acta Universitatis Palackianae Olomucensis. Gymnica, 01/2008, Letnik: 38, Številka: 3
    Journal Article

    Our paper focuses on differences in sensation seeking between male and female athletes who engage in high risk sports. There are several studies (Cox, 1994; Tusak & Tusak, 2001; Erjavec, 2002), which ...
Celotno besedilo
Dostopno za: FSPLJ, NUK, UL, UM, UPUK
4.
Celotno besedilo
Dostopno za: NUK, UL
5.
Celotno besedilo
Dostopno za: NUK, UL
6.
Celotno besedilo
Dostopno za: NUK, UL
7.
Celotno besedilo
Dostopno za: NUK, UL
8.
Celotno besedilo
Dostopno za: NUK, UL
9.
Celotno besedilo
Dostopno za: NUK, UL
10.
Celotno besedilo
Dostopno za: NUK, UL
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zadetkov: 40

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