E-viri
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Hsiao-Leng Li; Che-Lung Hung; Tuung Luoh; Ling-Wu Yang; Tahone Yang; Kuang-Chao Chen; Chih-Yuan Lu
2011 e-Manufacturing & Design Collaboration Symposium & International Symposium on Semiconductor Manufacturing (eMDC & ISSM), 2011-Sept.Conference Proceeding
A collection of slides from the author's conference presentation about the metal grain suppression and DOI capture rate improvement in 32 nm technology node is presented.
