48‐4: LTPO Technology Development for Enhanced Display Performance: Image Sticking Phenomena, Circuit Operation and Backplane Process Integration

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48‐4: LTPO Technology Development for Enhanced Display Performance: Image Sticking Phenomena, Circuit Operation and Backplane Process Integration

Cho, Daeyoun; Moon, Jiho; Kihm, T.-Y.; Choi, Y.-T.; Park, Jongwoo

SID International Symposium Digest of technical papers, June 2022, 2022-06-00, 20220601, Letnik: 53, Številka: 1

Journal Article

This paper details the low temperature poly‐crystalline silicon oxide (LTPO) thin‐film transistor (TFT) technology development primarily focused on image sticking (IS) and recovery behaviors, the backplane process optimization, which is painstaking multi‐faceted approach from TFT to panel to circuit, in order to ensure display performance and reliability. Palpable understanding on light induced IS and recovery, the dependency of bias layout design and backplane process integration are crucial.

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Cho, Daeyoun | Moon, Jiho | Kihm, T.-Y. | Choi, Y.-T. | Park, Jongwoo

Dostop do baze podatkov JCR je dovoljen samo uporabnikom iz Slovenije. Vaš trenutni IP-naslov ni na seznamu dovoljenih za dostop, zato je potrebna avtentikacija z ustreznim računom AAI.

Leto	Faktor vpliva		Izdaja		Kategorija		Razvrstitev
Leto	JCR	SNIP	JCR	SNIP	JCR	SNIP	JCR	SNIP

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