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  • Dual-Stage Nanopositioning ...
    Tuma, Tomas; Haeberle, Walter; Rothuizen, Hugo; Lygeros, John; Pantazi, Angeliki; Sebastian, Abu

    IEEE/ASME transactions on mechatronics, 06/2014, Letnik: 19, Številka: 3
    Journal Article

    This paper presents a dual-stage approach to nanopositioning in which the tradeoff between the scanner speed and range is addressed by combining a slow, large-range scanner with a short-range scanner optimized for high-speed, high-resolution positioning. We present the design, finite-element simulations, and experimental characterization of a fast custom-built short-range scanner. The short-range scanner is based on electromagnetic actuation to provide high linearity, has a clean, high-bandwidth dynamical response and is equipped with a low-noise magnetoresistance-based sensor. By using advanced noise-resilient feedback controllers, the dual-stage system allows large-range positioning with subnanometer closed-loop resolution over a wide bandwidth. Experimental results are presented in which the dual-stage scanner system is used for imaging in a custom-built atomic force microscope.