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Fu, Yuan Hsing; Liu, Ai Qun; Zhu, Wei Ming; Zhang, Xu Ming; Tsai, Din Ping; Zhang, Jing Bo; Mei, Ting; Tao, Ji Fang; Guo, Hong Chen; Zhang, Xin Hai; Teng, Jing Hua; Zheludev, Nikolay I.; Lo, Guo Qiang; Kwong, Dim Lee
Advanced functional materials, September 23, 2011, Letnik: 21, Številka: 18Journal Article
A micromachined reconfigurable metamaterial is presented, whose unit cell consists of a pair of asymmetric split‐ring resonators (ASRRs); one is fixed to the substrate while the other is patterned on a movable frame. The reconfigurable metamaterial and the supporting structures (e.g., microactuators, anchors, supporting frames, etc.) are fabricated on a silicon‐on‐insulator wafer using deep reactive‐ion etching (DRIE). By adjusting the distance between the two ASRRs, the strength of dipole–dipole coupling can be tuned continuously using the micromachined actuators and this enables tailoring of the electromagnetic response. The reconfiguration of unit cells endows the micromachined reconfigurable metamaterials with unique merits such as electromagnetic response under normal incidence and wide tuning of resonant frequency (measured as 31% and 22% for transverse electric polarization and transverse magnetic polarization, respectively). The reconfiguration could also allow switching between the polarization‐dependent and polarization‐independent states. With these features, the micromachined reconfigurable metamaterials may find potential applications in transformation optics devices, sensors, intelligent detectors, tunable frequency‐selective surfaces, and spectral filters. A micromachined reconfigurable metamaterial is presented by reconfiguring the unit cell that consists of a pair of asymmetric split‐ring resonators (ASRRs). The material shows wide dynamic tuning of resonant frequency for transverse electric (TE) and transverse magnetic (TM) polarization by changing the separation distance of the two ASRRs and has potential applications in transformation optics devices, sensors, intelligent detectors, and tunable frequency‐selective surfaces.
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in: SICRIS
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