E-viri
Recenzirano
Odprti dostop
-
Rovani, A.C.; Crespi, A.E.; Sonda, V.; Cemin, F.; Echeverrigaray, F.G.; Amorim, C.L.G.; Basso, R.L.O.; Baumvol, I.J.R.; Figueroa, C.A.
Surface & coatings technology, 02/2011, Letnik: 205, Številka: 11Journal Article
The mechanisms of plasma post-oxidation of plasma nitrided AISI 1045 plain steel were investigated. The influence of plasma post-oxidation temperature and time on the oxide layer thickness, morphology, and composition were addressed. The oxide thickness grows exponentially with temperature, with activation energy of 68±5kJmol −1. The time dependence of the oxide layer thickness, on the other hand, is governed by a diffusion-reaction process. It was verified that temperature plays an important role on the morphology of the oxide. Indeed, at the highest temperature, 550°C, the oxide layer is not homogeneous and has a lower hardness than oxide layers obtained at 480 to 500°C. The latter seem to be more favorable temperatures to grow compact, homogeneous, and harder oxide layers. The oxide–nitride bi-layer produced here contains a mixture of γ′-Fe4N and ε-Fe2-3N and only one iron oxide, Fe3O4 (magnetite). The proportions between these phases vary with the plasma processing temperature and time. ►Oxygen and nitrogen profiles were determined by alpha-particle resonant scattering. ►The oxide thickness as a function of time does not follow a pure parabolic law. ►The oxidation process is governed by a diffusion-reaction mechanism.
Avtor
![loading ... loading ...](themes/default/img/ajax-loading.gif)
Vnos na polico
Trajna povezava
- URL:
Faktor vpliva
Dostop do baze podatkov JCR je dovoljen samo uporabnikom iz Slovenije. Vaš trenutni IP-naslov ni na seznamu dovoljenih za dostop, zato je potrebna avtentikacija z ustreznim računom AAI.
Leto | Faktor vpliva | Izdaja | Kategorija | Razvrstitev | ||||
---|---|---|---|---|---|---|---|---|
JCR | SNIP | JCR | SNIP | JCR | SNIP | JCR | SNIP |
Baze podatkov, v katerih je revija indeksirana
Ime baze podatkov | Področje | Leto |
---|
Povezave do osebnih bibliografij avtorjev | Povezave do podatkov o raziskovalcih v sistemu SICRIS |
---|
Vir: Osebne bibliografije
in: SICRIS
To gradivo vam je dostopno v celotnem besedilu. Če kljub temu želite naročiti gradivo, kliknite gumb Nadaljuj.