E-resources
Peer reviewed
Open access
-
Ohta, Hiroshi; Horikiri, Fumimasa; Mochizuki, Kazuhiro; Mishima, Tomoyoshi
Materials Science Forum, 05/2022, Volume: 1062Journal Article
Impurity incorporation during vapor-phase epitaxy on stepped surfaces was modeled by classifying rate-limiting processes into i) surface diffusion, ii) step kinetics, and iii) segregation. Examples were shown for i) desorption-limited Al incorporation during chemical vapor deposition (CVD) of (0001) SiC, ii) preferential desorption of C atoms from kinks during CVD of Al-doped (000-1) SiC, and iii) segregation-limited C incorporation during metalorganic vapor-phase epitaxy of (0001), (000-1), and (10-10) GaN.
![loading ... loading ...](themes/default/img/ajax-loading.gif)
Shelf entry
Permalink
- URL:
Impact factor
Access to the JCR database is permitted only to users from Slovenia. Your current IP address is not on the list of IP addresses with access permission, and authentication with the relevant AAI accout is required.
Year | Impact factor | Edition | Category | Classification | ||||
---|---|---|---|---|---|---|---|---|
JCR | SNIP | JCR | SNIP | JCR | SNIP | JCR | SNIP |
Select the library membership card:
If the library membership card is not in the list,
add a new one.
DRS, in which the journal is indexed
Database name | Field | Year |
---|
Links to authors' personal bibliographies | Links to information on researchers in the SICRIS system |
---|
Source: Personal bibliographies
and: SICRIS
The material is available in full text. If you wish to order the material anyway, click the Continue button.