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Buchholt, K.; Eklund, P.; Jensen, J.; Lu, J.; Ghandi, R.; Domeij, M.; Zetterling, C.M.; Behan, G.; Zhang, H.; Lloyd Spetz, A.; Hultman, L.
Journal of crystal growth, 03/2012, Volume: 343, Issue: 1Journal Article
Epitaxial Ti3GeC2 thin films were deposited on 4° off-cut 4H-SiC(0001) using magnetron sputtering from high purity Ti, C, and Ge targets. Scanning electron microscopy and helium ion microscopy show that the Ti3GeC2 films grow by lateral step-flow with {112̄0} faceting on the SiC surface. Using elastic recoil detection analysis, atomic force microscopy, and X-Ray diffraction the films were found to be substoichiometric in Ge with the presence of small Ge particles at the surface of the film. ► Epitaxial growth of Ti3GeC2(0001) on 4H-SiC(0001) using magnetron sputtering. ► Ti3GeC2 films grow by lateral step-flow with {112̄0} faceting on the SiC surface. ► Films are substoichiometric in Ge with small Ge particles present at the surface.
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