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151.
  • Post-breakdown statistics a... Post-breakdown statistics and acceleration characteristics in high-K dielectric stacks
    Wu, E; Sune, J; Linder, B ... 2011 International Reliability Physics Symposium, 2011-April
    Conference Proceeding

    Contrary to recent claims, experimental results obtained in thin and thick Hafnium-based high-K gate dielectric stacks demonstrate that progressive breakdown is relevant in these insulators. For thin ...
Celotno besedilo
152.
  • Critical assessment of soft... Critical assessment of soft breakdown stability time and the implementation of new post-breakdown methodology for ultra-thin gate oxides [MOSFET]
    Wu, E.; Sune, J.; Linder, B. ... IEEE International Electron Devices Meeting 2003, 2003
    Conference Proceeding

    The reliability margin seriously shrinks when gate oxide thickness is scaled below 2 nm. In this work we pursue a general picture of the breakdown in ultra-thin oxides by studying the statistics of ...
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