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El Habra, N; Crociani, L; Sada, C; Zanella, P; Casarin, M; Rossetto, G; Carta, G; Paolucci, G
Chemistry of materials, 07/2007, Letnik: 19, Številka: 14Journal Article
A new synthetic route for the deposition of CoAl2O4 thin films at low temperature via MOCVD using the single-source precursor {CoAl(O i C3H7)42} is presented. Molecular properties of {CoAl(O i C3H7)42} have been investigated by means of NMR spectroscopy, mass spectrometry, and thermal analysis. Deposits have been characterized by XRD, AFM, UV−vis, and SIMS measurements.
