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Kuhn, K. J.; Giles, M. D.; Becher, D.; Kolar, P.; Kornfeld, A.; Kotlyar, R.; Ma, S. T.; Maheshwari, A.; Mudanai, S.
IEEE transactions on electron devices, 2011-Aug., 2011-08-00, 20110801, Letnik: 58, Številka: 8Journal Article
Moore's law technology scaling has improved performance by five orders of magnitude in the last four decades. As advanced technologies continue the pursuit of Moore's law, a variety of challenges will need to be overcome. One of these challenges is the management of process variation. This paper discusses the importance of process variation in modern transistor technology, reviews front-end variation sources, presents device and circuit variation measurement techniques, including circuit and memory data from the 32-nm node, and compares recent intrinsic transistor variation performance from the literature.
