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  • Lithographic Imaging Techni...
    Wallraff, G. M; Hinsberg, W. D

    Chemical reviews, 1999-Jul-14, Letnik: 99, Številka: 7
    Journal Article

    Wallraff and Hinsberg provide an overview of the issues to be considered for patterning in the sub-100 nm regime and describe the imaging technologies that are currently being evaluated for such use.