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Dai, M.; Guo, W.; Liu, X.; Zhang, M.; Wang, Y.; Wei, L. F.; Hilton, G. C.; Hubmayr, J.; Ullom, J.; Gao, J.; Vissers, M. R.
Journal of low temperature physics, 15/3, Letnik: 194, Številka: 5-6Journal Article
We deposit thin titanium nitride (TiN) and TiN/Ti/TiN multilayer films on sapphire substrates and measure the reflectance and transmittance in the wavelength range from 400 to 2000 nm using a spectrophotometer. The optical constants (complex refractive indices), including the refractive index n and the extinction coefficient k , have been derived. With the extracted refractive indices, we propose an optical stack structure using low-loss amorphous Si (a-Si) anti-reflective coating and a backside aluminum (Al) reflecting mirror, which can in theory achieve 100% photon absorption at 1550 nm. The proposed optical design shows great promise in enhancing the optical efficiency of TiN-based microwave kinetic inductance photon-number-resolving detectors.
