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Damlencourt, J.-F.; Renault, O.; Samour, D.; Papon, A.-M.; Leroux, C.; Martin, F.; Marthon, S.; Séméria, M.-N.; Garros, X.
Solid-state electronics, 2003, Letnik: 47, Številka: 10Journal Article
In this paper, we have correlated electrical measurements of thin HfO 2 layers deposited on SiO 2 by atomic layer deposition with angle-resolved X-ray photoelectron spectroscopy experiments. Results show that the HfO 2/Si interface layer (IL) is made of a SiO x layer underneath a Si-rich Hf-silicate layer. The increasing of the IL thickness, during annealing, was essentially due to the silicon oxidation by –OH groups remaining in the HfO 2 layer after deposition. Using shorter water pulse time, we were able to limit the SiO x growth during deposition. We have also observed, after annealing at 800 °C under nitrogen, a decreasing of the interfacial layer electrical thickness as well as an improvement of the equivalent oxide thickness of the stack.
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JCR | SNIP | JCR | SNIP | JCR | SNIP | JCR | SNIP |
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