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Atomic hydrogen processing of magnetron surfaces
Mozetič, Miran, 1961- ...
A magnetron is a powerful source of microwaves. In order to ensure high reliability and a long life time of these devices it is very important to remove all the impurities from the surfaces. This is ...provided by the use of several techniques including the chemical polishing in a mixture of organic and inorganic acids, the discharge cleaning, and the electron beam stimulating desorption. The application of these technologies is described. The discharge cleaning of the copper anode was provided by the use of a mild RF hydrogen plasma and a low pressure magnetized helium plasma. By these means, the surface layer of copper became oxygen free. The use of low pressure magnetized plasma enabled us to remove chemisorbed hydrogen from the central part of a magnetron. After this procedure, the magnetron was separated from the vacuum system. However, after some time, the surfaces of the central part of the magnetron were contaminated with hydrogen again. Since the pressure in the magnetron remained below ▫$10^{-7} mbar$▫ the contamination was due to surface diffusion of atomic hydrogen from a side tube of the device. When the magnetron was turned on, the layer of chemisorbed hydrogen was desorbed due toelectron bombardment of the anode causing an instant increase of pressure. In order to avoid this effect the magnetron anode had to be processed with a rather small flux of energetic electrons and pumped with a miniature ion getter pump prior to the use. We also found out that a barrier for surface diffusion of atomic hydrogen improves the properties of magnetrons.
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