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Structural analysis of Zr-N and Ti-N films prepared by reactive plasma beam deposition
Panjan, Peter, 1957- ...
It has been noted by several workers, that lattice constants of stoichiometric ZrN and TiN calculaated on the basis of (111), (200) and (220) diffraction peaks are different. We have investigated the ...effect of composition of Zr-N and Ti-N films and deposition temperature on lattice expansion. Zr-N and Ti-N films containing various at% of nitrogen were prepared by reactive sputter deposition in a Balzers Sputron plasma bean apparatus. Silicon (100), sapphire, alumina (Al[sub]2O[sub]3), fused silica and HSS were used as substrates. Both Zr-N and Ti-N films were grown at substrate temperatures of 180°C, while some of ZrN films at substrates temperatures between 400 and 700°C. Interpalanr distances and textures were determined using Seemann-Bohlin and Bragg-Brentano X-ray diffraction.
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