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Nizkotemperaturna redukcija tankih oksidnih plasti na kontaktni zlitini Fe60Ni40 = Low temperature reduction of thin oxide layers on Fe60Ni40 contact alloyMozetič, Miran, 1961- ; Sladič, T. ; Praček, BorutPrikazujemo rezultate študija nizkotemperaturne redukcije tanke oksidne plastina vzorcih Fe60Ni40 v vodikovi plazmi. Vzorce smo vzeli s proizvodne linije za ohišja mikroelektronskih komponent in jih ... izpostavili induktivno vzbujani RG vodikovi plazmi pri tlaku 50 Pa. Debelino oksidne plasti okoli 30 nm smo ocenili iz AES-profilnih analiz svežih vzorcev. Vzorce smo namestili na tanke kovinske nosilce s pritrjenim termočlenom, jih izpostavili plazmi terpri tem merili temperaturo. Opazili smo, da se vzorci v plazmi ogrejejo največ do 180°C. Vzorce smo izpostavili plazmi različno dolgo, od 10 s do 60 s, potem pa jih ponovno analizirali z AES. Ugotovili smo, da se oksidna plast reducira v plazmi po približno 20 s izpostave. Primerjava meritev poteka temperature vzorcev med izpostavo plazmi in AES-analiz je pokazala temperaturno odvisnost tudi pri razmeroma nizki temperaturi redukcije.Source: Kovine zlitine tehnologije = Metals alloys technologies. - ISSN 1318-0010 (Letn. 32, št. 3/4, 1998, str. 259-263)Type of material - article, component part ; adult, seriousPublish date - 1998Language - slovenianCOBISS.SI-ID - 19481861
Author
Mozetič, Miran, 1961- |
Sladič, T. |
Praček, Borut
Topics
plazemsko čiščenje |
vodikova plazma |
FeNi |
redukcija oksidov |
AES-profilna analiza |
hydrogen plasma |
discharge cleaning |
FeNi |
oxide reduction |
AES profile analysis
source: Kovine zlitine tehnologije = Metals alloys technologies. - ISSN 1318-0010 (Letn. 32, št. 3/4, 1998, str. 259-263)
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Database name | Field | Year |
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Links to authors' personal bibliographies | Links to information on researchers in the SICRIS system |
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Mozetič, Miran, 1961- | 10429 |
Praček, Borut | 09105 |
Source: Personal bibliographies
and: SICRIS
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