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  • Effectiveness of charged vacancies in diffusion of implanted boron in silicon
    Runovc, Franc
    Source: Electronics letters. - ISSN 0013-5194 (Vol. 16, no. 2, jan. 1980, str. 49-50)
    Type of material - article, component part ; adult, serious
    Publish date - 1980
    Language - english
    COBISS.SI-ID - 513630

source: Electronics letters. - ISSN 0013-5194 (Vol. 16, no. 2, jan. 1980, str. 49-50)
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