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Discharge cleaning with hydrogen plasmaMozetič, Miran, 1961-Tradicionalne metode čiščenja se naglo nadomeščajo z novimi tehnikami zaradi povečanih tehnoloških in ekoloških standardov. Možna zamenjava za mokro kemijsko čiščenje je plazemsko čiščenje. ... Oksidativne nečistoče odstranjujemo z uporabo nizkotlačne šibko ionizirane visokodisociirane vodikove plazme. Čiščenje je pretežno posledica potencialne interakcije visoko reaktivnih vodikovih delcev (predvsem atomov) s površinami trdnih snovi. Med obdelavo v vodikovi plazmi so vzorci običajno pri sobni temperaturi, tako da je metoda primerna tudi za čiščenje delikatnih vzorcev, kot so n.pr. arheološki predmeti. Reakcijski produkti kot so H[spodaj]2O, H[spodaj]2S, HCL, se desorbirajo s površin in so izčrpani iz sistema. Uporabnost metode je prikazana v primeru čiščenja mikroprocesorjev, kontaktnih trakov in starih kovancev.Source: Vacuum. - ISSN 0042-207X (Vol. 61, no. 2/4, May 2001, str. 367-371)Type of material - article, component part ; adult, seriousPublish date - 2001Language - englishCOBISS.SI-ID - 55266
Author
Mozetič, Miran, 1961-
Topics
vodikova plazma |
čiščenje |
mikroprocesorji |
stikala |
arheološki predmeti |
hydrogen plasma |
discharge cleaning |
chip |
contact material |
archaeological artifacts
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Mozetič, Miran, 1961- | 10429 |
Source: Personal bibliographies
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