VSE knjižnice (vzajemna bibliografsko-kataložna baza podatkov COBIB.SI)
  • Comparison of AES and EXAFS analysis of a thin ▫$Cu_xAl_y$▫ layer on Al substrate
    Mozetič, Miran, 1961- ...
    A layer of copper with the thickness of 0,5 ▫$\mi$▫m was sputter deposited on a commercially available alluminium foil with the thickness of 30 ▫$\mu$▫m. The composition of elements within the ... coating was determined with Auger Electron Spectroscopy (AES) depth profiling, while the structure eas determined with Extended X-Ray Absorption Fine Structure (EXAFS) and X-Ray Diffraction (XRD). Samples were exposed to a low pressure weakly ionized hydrogen plasma with a high H density. Due to extensive recombination of hydrogen atoms on copper surface the samples were heated to 300°C so that diffusion of elements within the coataing took place. After the plasma treatment, the samples were analyzed with AES and EXAFS again. The AES depth profiles showed that a rather uniform coating consisting of 66 at.% of Al and 33 at.% of Cu was formed. Comparison of the shape of the main Auger LMM peak of pure Cu and that of ▫$Cu_xAl_y$▫ coating showed a substantial difference. The XRD analysis showed the presence of crystalline ▫$CuAl_2$▫ phase. However, the EXAFS analysis showed that the coating was not astoichiometric ▫$CuAl_2$▫, but rather the Cu/Al solid solution rich in ▫$CuAl_2$▫.
    Vir: Vacuum. - ISSN 0042-207X (Vol. 50, no. 3-4, July/August 1998, str. 299-304)
    Vrsta gradiva - članek, sestavni del ; neleposlovje za odrasle
    Leto - 1998
    Jezik - angleški
    COBISS.SI-ID - 25570

vir: Vacuum. - ISSN 0042-207X (Vol. 50, no. 3-4, July/August 1998, str. 299-304)
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