The results of studying the influence of the finite tunneling transparency of injection barriers in light-emitting diodes with InGaN/GaN quantum wells on the dependences of the current, capacitance, ...and quantum efficiency on the
p-n
junction voltage and temperature are presented. It is shown that defectassisted hopping tunneling is the main transport mechanism through the space charge region (SCR) and makes it possible to lower the injection barrier. It is shown that, in the case of high hopping conductivity through the injection barrier, the tunnel-injection current into InGaN band-tail states is limited only by carrier diffusion from neutral regions and is characterized by a close-to-unity ideality factor, which provides the highest quantum and power efficiencies. An increase in the hopping conductivity through the space charge region with increasing frequency, forward bias, or temperature has a decisive effect on the capacitance-voltage characteristics and temperature dependences of the high-frequency capacitance and quantum efficiency. An increase in the density of InGaN/GaN band-tail states and in the hopping conductivity of injection barriers is necessary to provide the high-level tunnel injection and close-to-unity power efficiency of high-power light-emitting diodes.
The mechanism of the internal quantum efficiency droop in InGaN/GaN structures with multiple quantum wells at current densities of up to 40 A cm
−2
in high-power light-emitting diodes is analyzed. It ...is shown that there exists a correlation between the efficiency droop and the broadening of the high-energy edge of the emission spectrum with increasing current density. It is also demonstrated that the efficiency is a spectrum-dependent quantity and the emission of higher energy photons starts to decrease at higher current densities. The effect of tunneling and thermally activated mechanisms of thermalization of carriers captured into shallow band-tail states in the energy gap of InGaN on the efficiency and the emission spectrum’s shape is considered. Analysis of the results obtained suggests that the efficiency droop occurs at high current densities because of the relative rise in the contribution from nonradiative recombination via defect states as a result of the increasing occupancy of deep band-tail states in InGaN. It is shown that power efficiency close to the theoretical limit can be obtained in the case of low-voltage tunnel injection into localized band-tail states in the InGaN active region.
The quantum efficiency of GaN LED structures has been studied at various temperatures and biases. It was found that an efficiency falloff is observed with increasing current density and, ...simultaneously, the tunnel component of the current through the LED grows and the quasi-Fermi levels reach the mobility edge in the InGaN active layer. It is shown that the internal quantum efficiency falloff with increasing current density is due to the carrier leakage from the quantum well as a result of tunnel transitions from its band-tail states to local defect-related energy levels within the energy gaps of the barrier layers.
Comparative study of the photoluminescence (PL) from quantum wells (QWs) in forward-biased
p
-GaN/InGaN/
n
-GaN structures and electroluminescence from these structures has been carried out. It is ...shown that, upon application of a forward bias, a characteristic red shift of the spectral peak is observed, together with a broadening of the PL line and simultaneous burning-up of the PL. This results from a decrease in the field strength in the space charge region of the
p
-
n
junction and suppression of the tunneling leakage of the carrier from band-tail states in the active InGaN layer. An analysis of the results obtained demonstrated that the tunneling strongly affects the quantum efficiency and enabled evaluation of the internal quantum efficiency of the structures. It is shown that nonequilibrium population of band-tail states in InGaN/GaN QWs depends on the injection type and is controlled by the capture of carriers injected into a QW, in the case of optical injection, and by carrier tunneling “below” the QW under electrical injection.
GaN films with thickness up to 3 mm were grown by halide vapour phase epitaxy method. Two growth modes were observed: the high temperature (HT) mode and the low temperature (LT) mode. Films grown in ...HT mode had smooth surface, however the growth stress was high and caused cracking. Films grown in LT mode had rough surface with high density of V-defects (pits), however such films were crack-free. The influence of growth parameters on the pit shape and evolution was investigated. Origins of pits formation and process of pit overgrowth are discussed. Crack-free films with smooth surface and reduced density of pits were grown using combination of the LT and HT growth modes.
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