E-viri
-
Park, Chanhoo; Choi, Minkwon; Kim, ChangHyun; Koo, Bonhyeok; Kweon, O Young; Park, Jinhyeung; Jung, Juyoung; Choi, Yunki; Lee, Kyoung-Woo; Ahn, Jeong Hoon; Ku, Ja-Hum
2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM)Conference Proceeding
This paper describes two advanced technologies recently adopted in back-end-of-line (BEOL) process for our logic products: self-aligned-universal-patterning (SAUP) and sacrificial oxide layer (SOL). Advantages of SAUP include improved extreme ultraviolet (EUV) throughput, reduced pinch-off type patterning defects, improved reliability, and lower power rail resistance. SOL is found to be an effective means to avoid dielectric damage and resulting RC degradation occurred by multiple etch processes.
![loading ... loading ...](themes/default/img/ajax-loading.gif)
Vnos na polico
Trajna povezava
- URL:
Faktor vpliva
Dostop do baze podatkov JCR je dovoljen samo uporabnikom iz Slovenije. Vaš trenutni IP-naslov ni na seznamu dovoljenih za dostop, zato je potrebna avtentikacija z ustreznim računom AAI.
Leto | Faktor vpliva | Izdaja | Kategorija | Razvrstitev | ||||
---|---|---|---|---|---|---|---|---|
JCR | SNIP | JCR | SNIP | JCR | SNIP | JCR | SNIP |
Baze podatkov, v katerih je revija indeksirana
Ime baze podatkov | Področje | Leto |
---|
Povezave do osebnih bibliografij avtorjev | Povezave do podatkov o raziskovalcih v sistemu SICRIS |
---|
Vir: Osebne bibliografije
in: SICRIS
To gradivo vam je dostopno v celotnem besedilu. Če kljub temu želite naročiti gradivo, kliknite gumb Nadaljuj.