We present a comprehensive review and outlook of silicon carbide (SiC) and gallium nitride (GaN) transistors available on the market for current and next-generation power electronics. Material ...properties and structural differences among GaN and SiC devices are first discussed. Based on the analysis of different commercially available GaN and SiC power transistors, we describe the state-of-the-art of these technologies, highlighting the preferential power conversion topologies and the key characteristics of each technological platform. Current and future fields of application for GaN and SiC devices are also reviewed. The article also reports on the main reliability aspects related to both technologies. For GaN HEMTs, threshold voltage stability, dynamic ON-resistance, and breakdown limitation are described, whereas for SiC MOSFETs the analysis also focuses on gate oxide failure and short-circuit (SC) robustness. Finally, we give an overview on the perspective of such materials in different fields of interest. An indication of possible future improvements and developments for both technologies is drawn. The requirements for hybrid converters, along with a careful optimization of performance and the use of innovative optimization tools, are underlined.
This paper reports on the impact of soft- and hard-switching conditions on the dynamic ON-resistance of AlGaN/GaN high-electron mobility transistors. For this study, we used a special double pulse ...setup, which controls the overlapping of the drain and gate waveforms (thus inducing soft and hard switching), while measuring the corresponding impact on the ON-resistance, drain current, and electroluminescence (EL). The results demonstrate that the analyzed devices do not suffer from dynamic R ON increase when they are submitted to soft switching up to V DS = 600 V. On the contrary, hard-switching conditions lead to a measurable increase in the dynamic ON-resistance (dynamic-R ON ). The increase in dynamic R ON induced by hard switching is ascribed to hot-electrons effects: during each switching event, the electrons in the channel are accelerated by the high electric field and subsequently trapped in the AlGaN/GaN heterostructure or at the surface. This hypothesis is supported by the following results: 1) the increase in R ON is correlated with the EL signal measured under hard-switching conditions and 2) the impact of hard switching on dynamic R ON becomes weaker at high-temperature levels, as the average energy of hot electrons decreases due to the increase scattering with the lattice.
Compact modeling of charge trapping processes in GaN transistors is of fundamental importance for advanced circuit design. The goal of this article is to propose a methodology for modeling the ...dynamic characteristics of GaN power HEMTs in the realistic case where trapping/detrapping kinetics are described by stretched exponentials, contrary to ideal pure exponentials, thus significantly improving the state of the art. The analysis is based on: 1) an accurate methodology for describing stretched-exponential transients and extracting the related parameters and 2) a novel compact modeling approach, where the stretched exponential behavior is reproduced via multiple RC networks, whose parameters are specifically tuned based on the results of 1). The developed compact model is then used to simulate the transient performance of the HEMT devices as a function of duty cycle and frequency, thus providing insight on the impact of traps during the realistic switching operation.
Display omitted
•We provide give an overview on the most common degradation processes of GaN-based HEMTs.•We describe the time-dependence of gate degradation mechanism during off-state tests.•The ...influence of the reverse voltage as degradation accelerating factor is also provided.•We present a combined electrical, thermal and EL analysis of hot electrons degradation.•We define a methodology for the evaluation hot electrons effects.
This paper describes a deep investigation of the degradation mechanisms induced by off-state and on-state stress in AlGaN/GaN HEMTs. Concerning reverse-bias degradation, results underline that the exposure to reverse-bias stress can induce (i) a recoverable change in the gate current due to the accumulation of negative charges under the gate, (ii) and a permanent degradation of gate characteristics due to the generation of vertical parasitic leakage paths through the AlGaN layer. Further analysis of the kinetics of this degradation mechanism, correlated with time-resolved Electroluminescence (EL) measurements, allowed to define a model that explains the time-dependence of the phenomenon and the role of gate voltage as accelerating factor, providing an interpretation for both recoverable and permanent modifications of the main device characteristics induced by reverse-bias stress.
On the other hand, on devices that have shown an improved robustness against the reverse-bias gate degradation, we investigated the origin of the degradation under on-state stress. In this case, results obtained with a combined electrical and optical analysis, showed that on-state stress may induce a significant decrease in drain saturation current and Electroluminescence (EL) signal, with a degradation rate that strongly depends on the EL intensity measured before stress, which is representative of the presence of hot-electrons in the channel. On-state degradation can be ascribed to a decrease in the electric-field, due to the trapping of electrons within the barrier or at the surface induced by hot-electrons. Therefore, by using the EL signal as measure of the stress accelerating factor, it was possible to derive an acceleration law for hot-electron degradation on GaN HEMTs.
PDF
