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hits: 82
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  • 0.6nm-EOT high-k gate stack... 0.6nm-EOT high-k gate stacks with HfSiOx interfacial layer grown by solid-phase reaction between HfO2 and Si substrate
    OGAWA, A; IWAMOTO, K; OTA, H ... Microelectronic engineering, 09/2007, Volume: 84, Issue: 9-10
    Conference Proceeding, Journal Article
    Peer reviewed

    We have developed a process for forming an ultra-thin HfSiOx interfacial layer (HfSiOx-IL) for high-k gate stacks. The HfSiOx-IL was grown by the solid-phase reaction between HfO2 and Si-substrate ...
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  • High risk of gallbladder ca... High risk of gallbladder carcinoma in elderly patients with segmental adenomyomatosis of the gallbladder
    Nabatame, N; Shirai, Y; Nishimura, A ... Journal of experimental & clinical cancer research 23, Issue: 4
    Journal Article
    Peer reviewed

    The clinical significance of adenomyomatosis of the gallbladder remains unclear. This study aimed to clarify the relationship between segmental adenomyomatosis and gallbladder carcinoma, and to ...
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  • Neural correlates of impair... Neural correlates of impaired performance on the clock drawing test in Alzheimer's disease
    Nagahama, Yasuhiro; Okina, Tomoko; Suzuki, Norio ... Dementia and geriatric cognitive disorders, 05/2005, Volume: 19, Issue: 5-6
    Journal Article
    Peer reviewed

    To identify the neural correlates for impaired performance on the clock drawing test (CDT) in patients with Alzheimer's disease (AD), we examined the relationship between the CDT performances and the ...
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25.
  • Cerebral correlates of the ... Cerebral correlates of the progression rate of the cognitive decline in probable Alzheimer's disease
    Nagahama, Yasuhiro; Nabatame, Hidehiko; Okina, Tomoko ... European neurology, 01/2003, Volume: 50, Issue: 1
    Journal Article
    Peer reviewed

    To evaluate the possible relation between the rate of cognitive deterioration in patients with probable Alzheimer's disease (AD) and the distribution pattern of neural dysfunction. The regional ...
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26.
  • Factor structure of a modif... Factor structure of a modified version of the wisconsin card sorting test: an analysis of executive deficit in Alzheimer's disease and mild cognitive impairment
    Nagahama, Yasuhiro; Okina, Tomoko; Suzuki, Norio ... Dementia and geriatric cognitive disorders, 01/2003, Volume: 16, Issue: 2
    Journal Article
    Peer reviewed

    In order to explore the factor structure of a modified version of the Wisconsin Card Sorting Test (mWCST) and to identify the dimensions of deficit in patients with Alzheimer's disease (AD) and mild ...
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27.
  • Strain relaxation near high... Strain relaxation near high-k/Si interface by post-deposition annealing
    Emoto, T.; Akimoto, K.; Yoshida, Y. ... Applied surface science, 05/2005, Volume: 244, Issue: 1
    Journal Article, Conference Proceeding
    Peer reviewed

    We studied the effect of post-deposition annealing on a HfO 2/Si interface of by extremely asymmetric X-ray diffraction. Comparing the rocking curves before annealing the sample with those of the ...
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  • Crystallographic and electr... Crystallographic and electrical properties of platinum film grown by chemical vapor deposition using (methylcyclopentadienyl)trimethylplatinum
    Hiratani, Masahiko; Nabatame, Toshihide; Matsui, Yuichi ... Thin solid films, 05/2002, Volume: 410, Issue: 1
    Journal Article
    Peer reviewed

    Platinum thin films grown by chemical vapor deposition (CVD) using a liquid precursor of (methylcyclopentadienyl)trimethylplatinum were characterized in terms of crystallographic nature, morphology, ...
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  • Changes in effective work f... Changes in effective work function of HfxRu1-x alloy gate electrode
    NABATAME, T; NUNOSHIGE, Y; KADOSHIMA, M ... Microelectronic engineering, 07/2008, Volume: 85, Issue: 7
    Journal Article
    Peer reviewed

    Effective work function (m,eff) values of Hfx Ru1-x alloy gate electrodes on SiO2 metal-oxide-semiconductor (MOS) capacitors were carefully examined to assess whether the m,eff was determined by the ...
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