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Meritve mehanskih napetosti tankih plasti PECVD silicijevega nitrida in oksinitrida = Mechanical stress measurements in thin PECVD silicon nitride and silicon oxynitride filmsGspan, Boštjan ; Osredkar, RadkoMeritve mehanskih napetosti tankih plasti plazemsko nanešenega silicijevega nitrida in oksinitrida kažejo, da so v obeh vrstah filmov po depoziciji napetosti tlačne. Rezultati kažejo na povezavo med ... vrednostmi lomnih količnikov filmov silicijevega nitrida in njihovimi mehanskimi napetostmi, medtem, ko pri silicijevem oksinitridu take povezave ni.Source: Informacije MIDEM : časopis za mikroelektroniko, elektronske sestavne dele in materiale = časopis za mikroelektroniku, elektronske sastavne dijelove i materijale = journal of microelectronics, electronic components and materials. - ISSN 0352-9045 (Let. 19, št. 3, september 1989, str. 155-156)Type of material - article, component partPublish date - 1989Language - slovenianCOBISS.SI-ID - 14256386
Author
Gspan, Boštjan |
Osredkar, Radko
Topics
Merna tehnika |
silicijum nitrid i oksinitrid |
fizika plazme |
plazemske depozicije |
tanke plasti |
silicij |
tanke plasti |
dielektriki |
tlačna napetost |
meritve napetosti |
plasma depositions |
thin films |
silicon |
dielectrics films |
mechanical stress |
stress measurements
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source: Informacije MIDEM : časopis za mikroelektroniko, elektronske sestavne dele in materiale = časopis za mikroelektroniku, elektronske sastavne dijelove i materijale = journal of microelectronics, electronic components and materials. - ISSN 0352-9045 (Let. 19, št. 3, september 1989, str. 155-156)
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Database name | Field | Year |
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Gspan, Boštjan | 11186 |
Osredkar, Radko | 01118 |
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