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Interaction between model poly(ethylene terephthalate) thin films and weakly ionised oxygen plasmaDoliška, Aleš ...Model films of poly(ethylene terephthalate) were treated by oxygen plasma in order to quantify the etching rate and estimate the contribution of charged and neutral particles to the reaction ... probability. Model films with a thickness of 50 nm were deposited on a quartz crystal of a microbalance (QCM) by spin-coating technique. The samples were exposed to oxygen plasma with the positive ion density of 4 * 1015 m-3 and neutral oxygen atom density of 6 * 1021 m-3. The etching rate was determined from the QCM signal and was 4.7 nm s-1. The etching was found rather inhomogeneous as the atomic force microscopic images showed an increase of the surface roughness as a result of plasma treatment. The model films were completely removed from the surface of the quartz crystals in about 12 s. Knowing the etching rate and the flux of oxygen atoms to the surface allowed for calculation of the reaction probability which was found to be rather low at the value of 1.6 * 10-4.Source: Surface and interface analysis. - ISSN 0142-2421 (Vol. 44, iss. 1, Jan. 2012, str. 56-61)Type of material - article, component partPublish date - 2012Language - englishCOBISS.SI-ID - 14931478
Author
Doliška, Aleš |
Vesel, Alenka |
Kolar, Metod |
Stana-Kleinschek, Karin |
Mozetič, Miran, 1961-
Topics
kisikova plazma |
funkcionalizacija |
QCM |
omočljivost |
XPS |
AFM |
jedkanje |
oxygen plasma |
functionalisation |
QCM |
wettability |
XPS |
AFM |
etching
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DRS, in which the journal is indexed
Database name | Field | Year |
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Links to authors' personal bibliographies | Links to information on researchers in the SICRIS system |
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Doliška, Aleš | 17577 |
Vesel, Alenka | 20048 |
Kolar, Metod | 33585 |
Stana-Kleinschek, Karin | 07814 |
Mozetič, Miran, 1961- | 10429 |
Source: Personal bibliographies
and: SICRIS
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