Display omitted •Shiff base GMA-I as a novel effective UV-absorber for ink platform.•Extra high molar absorption coefficient of 43,554 M−1 cm−1.•High thermal stability up to 271.4 °C with a melting point of 137.59 °C.•Highly UV protection additive for ink platform with a low content of 2 wt% Schiff base is a diverse group of organic compounds and has potential as a UV absorber for ink systems due to its high UV protection, simple synthesis, and high dispersion in organic matrices. In this work, a novel Schiff base α-(4-(2,3-dihydroxylpropoxy)phenylimino)-o-cresol (named GMA-I) was synthesized and investigated as a UV absorber for ink system. The UV-protection of GMA-I was evaluated on ink-coated duplex substrate samples via color measurement using an accelerated UV test chamber. The results showed that the GMA-I exhibited strong absorption in both UVA and UVB regions with an extra high molar absorption coefficient of 43,554 M−1 cm−1, and high thermal stability of 271.4 °C. Interestingly, the GMA-I showed high UV protection for ink platform at low content of 2 wt% thank to the intramolecular proton transfer mechanism and therefore potential as a UV absorber additive for ink systems.