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  • Fabrication development for...
    Yang, J.K.W.; Dauler, E.; Ferri, A.; Pearlman, A.; Verevkin, A.; Gol'tsman, G.; Voronov, B.; Sobolewski, R.; Keicher, W.E.; Berggren, K.K.

    IEEE transactions on applied superconductivity, 06/2005, Volume: 15, Issue: 2
    Journal Article

    We have developed a fabrication process for GHz-counting-rate, single-photon, high-detection-efficiency, NbN, nanowire detectors. We have demonstrated two processes for the device patterning, one based on the standard polymethylmethacrylate (PMMA) organic positive-tone electron-beam resist, and the other based on the newer hydrogen silsesquioxane (HSQ) negative-tone spin-on-glass resist. The HSQ-based process is simple and robust, providing high resolution and the prospect of high fill-factors. Initial testing results show superconductivity in the films, and suggest that the devices exhibit photosensitivity.