E-viri
Recenzirano
Odprti dostop
-
Chen, Zhi; Zhou, Hongbing; Wu, Cheng; Zhang, Guojun; Yan, Hongzhi
Materials, 06/2022, Letnik: 15, Številka: 12Journal Article
In wire electrical discharge machining, due to the random distribution of the insulating SiC particles, frequent wire rupture, low machining efficiency and surface quality when the common brass wire electrode (BWE) is used to process high-volume content SiCp/Al composite often appears. To address this issue, this paper proposes a new preparation method of zinc coating and surface microstructure on wire electrodes (ZCSMWE). The preparation process of ZCSMWE includes casting, coating, annealing and plastic processing. The experimental results show that, compared with BWE, ZCSMWE can increase material removal rate (MRR) by 16.67%, reduce surface roughness (Ra) by 21.18% and reduce wire rupture under the same discharge parameters. The analysis of workpiece surface topography shows that ZCSMWE can significantly decrease the recast layer and microcrack on the machined surface. The improvement mechanism of ZCSMWE main includes: The low work function zinc can promote the forming of the discharge channel. The vaporization of low boiling temperature zinc can reduce the temperature of the discharge gap and promote the ejecting of workpiece material. In addition, the surface microstructure on ZCSMWE can make the discharge spark more uniformly distributed and increase the proportion of the effective discharge, which contributes to making the discharge crater on the workpiece and wire electrode shallower and more uniform. The surface microstructure on ZCSMWE can also effectively improve the dielectric circulation, which can promote discharge debris to be expelled out and reduce the temperature in the discharge gap. Then, the wire rupture and microcracks on the workpiece surface can be reduced.
![loading ... loading ...](themes/default/img/ajax-loading.gif)
Vnos na polico
Trajna povezava
- URL:
Faktor vpliva
Dostop do baze podatkov JCR je dovoljen samo uporabnikom iz Slovenije. Vaš trenutni IP-naslov ni na seznamu dovoljenih za dostop, zato je potrebna avtentikacija z ustreznim računom AAI.
Leto | Faktor vpliva | Izdaja | Kategorija | Razvrstitev | ||||
---|---|---|---|---|---|---|---|---|
JCR | SNIP | JCR | SNIP | JCR | SNIP | JCR | SNIP |
Baze podatkov, v katerih je revija indeksirana
Ime baze podatkov | Področje | Leto |
---|
Povezave do osebnih bibliografij avtorjev | Povezave do podatkov o raziskovalcih v sistemu SICRIS |
---|
Vir: Osebne bibliografije
in: SICRIS
To gradivo vam je dostopno v celotnem besedilu. Če kljub temu želite naročiti gradivo, kliknite gumb Nadaljuj.