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Bedeschi, F.; Fackenthal, R.; Resta, C.; Donze, E.M.; Jagasivamani, M.; Buda, E.C.; Pellizzer, F.; Chow, D.W.; Cabrini, A.; Calvi, G.; Faravelli, R.; Fantini, A.; Torelli, G.; Mills, D.; Gastaldi, R.; Casagrande, G.
IEEE journal of solid-state circuits, 2009-Jan., 2009, 2009-01-00, 20090101, Letnik: 44, Številka: 1Journal Article, Conference Proceeding
In this paper, a 90-nm 128-Mcell non-volatile memory based on phase-change Ge 2 -Sb 2 -TeB alloy is presented. Memory cells are bipolar selected, and are based on a /xtrench architecture. Experimental investigation on multi-level cell (MLC) storage is addressed exploiting the chip MLC capability. To this end, a programming algorithm suitable for 2 bit/cell storage achieving tightly placed inner states (in terms of cell current or resistance) is proposed. Measurements showed the possibility of placing the required distinct cell current distributions, thus demonstrating the feasibility of the MLC phase-change memory (PCM) storage concept. Endurance tests were also carried out. Cumulative distribu tions after 2-bit/cell programming before cycling and after 100 k program cycles followed by 1 h/150 degC bake are presented. Experimental results on MLC endurance are also provided from a 180-nm 8-Mb PCM demonstrator with the same mutrench cell structure.
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in: SICRIS
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