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Wei Jin; Weidong Liu; Fung, S.K.H.; Chan, P.C.H.; Chenming Hu
IEEE transactions on electron devices, 04/2001, Letnik: 48, Številka: 4Journal Article
The buried-oxide in SOI MOSFET inhibits heat dissipation in the Si film and leads to increase in transistor temperature. This paper reports a simple and accurate characterization method for the self-heating effect (SHE) in SOI MOSFETs. The AC output conductance at a chosen bias point is measured at several frequencies to determine the thermal resistance (R/sub th/) and thermal capacitance (C/sub th/) associated with the SOI device. This methodology is important to remove the misleadingly large self-heating effect from the DC I-V data in device modeling. Not correcting for SHE may lead to significant error in circuit simulation. After SHE is accounted for, the frequency-dependent SHE may be disabled in circuit simulation without sacrificing the accuracy, thus providing faster circuit simulation for high-frequency circuits.
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Leto | Faktor vpliva | Izdaja | Kategorija | Razvrstitev | ||||
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JCR | SNIP | JCR | SNIP | JCR | SNIP | JCR | SNIP |
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Vir: Osebne bibliografije
in: SICRIS
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