XPS Depth Profiling of Air-Oxidized Nanofilms of NbN on GaN Buffer-Layers Lubenchenko, A.V.; Batrakov, A.A.; Krause, S. ...
4th International School and Conference "Saint Petersburg OPEN 2017" on Optoelectronics, Photonics, Engineering and Nanostructures, Saint Petersburg, Russia,
11/2017, Letnik:
917, Številka:
9
Journal Article, Conference Proceeding
Recenzirano
Odprti dostop
XPS depth chemical and phase profiling of an air-oxidized niobium nitride thin film on a buffer-layer GaN is performed. It is found that an intermediate layer of Nb5N6 and NbONx under the layer of ...niobium oxide is generated.
Interface Layers of Niobium Nitride Thin Films Lubenchenko, A V; Iachuk, V A; Krause, S ...
6th International School and Conference on Optoelectronics, Photonics, Engineering and Nanostructures, SPbOPEN 2019, Saint Petersburg, Russia,
12/2019, Letnik:
1410, Številka:
1
Journal Article, Conference Proceeding
Recenzirano
Odprti dostop
Intermediate layers formed by thin NbN films are studied. A surface phase of NbN different from the bulk one under the oxide layer and a layer consisting of NbNx-SiOy between the film and the ...substrate are found.
A new method of X-ray photoelectron spectra processing based on a target model with a stochastic surface layer is proposed. On the basis of this model, X-ray photoelectron spectra of multilayer ...multicomponent metallic targets with an inhomogeneous surface layer are obtained for various probing angles considering surface shading effects. A layer-by-layer phase profile of metallic samples is obtained using the advanced method of surface analysis based on angle-resolved X-ray photoelectron spectroscopy. The results are validated by atomic force microscopy.
The work presents ThinFilmsAnalysisMPEI software implementing the method of chemical and phase depth profiling based on photoelectron spectra interpretation, described in paper 1. Efficiency and ...productivity of the software for the problem of chemical and depth profiling is shown on examples of synthetic and experimental spectra.
Layer chemical and phase profiling of niobium nitride thin films on a silicon substrate oxidized on air was performed with the help of a method designed by us. The method includes: a new method of ...background subtraction of multiple inelastically scattered photoelectrons considering depth inhomogeneity of electron inelastic scattering; a new method of photoelectron line decomposition into component peaks considering physical nature of different decomposition parameters; joint solution of the background subtraction and photoelectron line decomposition problems; control of line decomposition accuracy with the help of a suggested performance criterion; calculation of layer thicknesses for a multilayer target using a simple formula.
Air-Oxidation of Nb Nano-Films Lubenchenko, A. V.; Batrakov, A. A.; Ivanov, D. A. ...
Semiconductors (Woodbury, N.Y.),
05/2018, Letnik:
52, Številka:
5
Journal Article
Recenzirano
X-ray photoelectron spectroscopy (XPS) depth chemical and phase profiling of air-oxidized niobium nanofilms has been performed. It is found that oxide layer thicknesses depend on the initial ...thickness of the niobium nanofilm. The increase in thickness of the initial Nb nano-layer is due to increase in thickness of an oxidized layer.
In this work, a new method of background subtraction in XPS is suggested considering multiple inelastic scattering in a multilayer inhomogeneous target. The method is based on solution of the problem ...of multiple inelastic photoelectron scattering in a multilayer plane-parallel target. For a overlayer/substrate system, formulae for subtraction of background generated by multiple inelastic photoelectron scattering are found. It is shown that backgroundы of a spectral line of photoelectrons emitted from the overlayer and emitted from the substrate and inelastically scattered in the overlayer differ significantly.
Within the framework of the classical radiative transfer theory 1–3, signal shaping of the most recently needed method of electron spectroscopy – X-ray Photoemission Spectroscopy (XPS) is analyzed. ...The boundary problem for the photoelectron transfer equation is solved on the basis of invariant embedding methods. Approximate analytical solutions of the derived equations are determined using the spherical harmonics method, straight line and transport approximations. The exact solutions are obtained by numerical matrix methods. The obtained results are analyzed comparing the calculation data to the results of MC simulation. High efficiency of the numerical matrix methods is shown for inverse problem solution in XPS. Errors of the straight line and transport approximations are estimated.
•We calculate exact numerical solutions for XPS elastic peak angular distributions.•XPS angular distributions were calculated for a finite thickness layer.•Numerical solution is compared to transport and straight line approximations.
This work covers a method of non-destructive layer profiling of ultra-thin films on solid. The method is based on solution of the problem of elastic and inelastic photoelectron scattering in ...multilayer inhomogeneous films. An example of depth profiling of an air-oxidized ultra-thin chromium film on a silicon substrate is given.
XPS Study of Niobium and Niobium-Nitride Nanofilms Lubenchenko, A. V.; Batrakov, A. A.; Shurkaeva, I. V. ...
Surface investigation, x-ray, synchrotron and neutron techniques,
07/2018, Letnik:
12, Številka:
4
Journal Article
Recenzirano
A new, XPS-based approach to quantitative and nondestructive determination of the chemical and phase layer composition of multicomponent multilayer films is proposed. It includes a new method for ...subtracting the background of repeatedly inelastically scattered photoelectrons, taking into account the inhomogeneity of inelastic scattering over depth; a new way of decomposing a photoelectron line into component peaks, taking into account the physical nature of various decomposition parameters; solution of the problem of subtracting the background and decomposing the photoelectron line simultaneously; and determination of the thickness of the layers of a multilayer target using a simple equation. The phase-layer composition of nanoscale Nb and NbN films is determined, and the thicknesses of these layers are calculated.
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