(UL)
-
Removal of a thin hydrogenated carbon film by oxygen plasma treatment = Odstranjevanje tanke plasti hidrogeniranega ogljika s kisikovo plazmoCvelbar, Uroš, 1975-Capability of low pressure oxygen as a medium for removal of hydrogenated carbon thin films is demonstrated. The film was deposited onto polished iron discs by CVD method. Discs were mounted into a ... discharge chamber which was evacuated to the ultimate pressure of about 5 Pa. Methane of commercial puritywas leaked into the chamber during continuous pumping so the pressure of 100 Pa was established. Weakly ionized plasma was then created in the chamber by an inductively coupled RF generator operating at the frequency of 27.12 MHz and the power of about 200 W. The methane molecules dissociated in the plasma forming CHx radicals that adsorbed on the sample surface causing formation of a thin film of hydrogenated carbon. AES depth profiling showed that a 3 nm thick film was formed after 200 s of plasma treatment. Samples were then exposed to oxygen plasma in the same chamber, and characterized by AES as well as water drop contact angle. After 12 s of oxygen plasma treatmentthe samples were visually free of carbon and the AES depth profiling proved it. The contact angle of a water drop decreased from initial 80° to about 10° indicating a rapid transformation of the surface properties from hydrophobic to hydrophilic character. The experiments allowed for estimation of the cleaning efficiency which was about 0.25 nm/s.Vir: Materiali in tehnologije = Materials and technology. - ISSN 1580-2949 (Letn. 45, št. 3, 2011, str. 179-183)Vrsta gradiva - članek, sestavni delLeto - 2011Jezik - angleškiCOBISS.SI-ID - 857514
vir: Materiali in tehnologije = Materials and technology. - ISSN 1580-2949 (Letn. 45, št. 3, 2011, str. 179-183)
Vnos na polico
Trajna povezava
- URL:
Faktor vpliva
Dostop do baze podatkov JCR je dovoljen samo uporabnikom iz Slovenije. Vaš trenutni IP-naslov ni na seznamu dovoljenih za dostop, zato je potrebna avtentikacija z ustreznim računom AAI.
Leto | Faktor vpliva | Izdaja | Kategorija | Razvrstitev | ||||
---|---|---|---|---|---|---|---|---|
JCR | SNIP | JCR | SNIP | JCR | SNIP | JCR | SNIP |
Baze podatkov, v katerih je revija indeksirana
Ime baze podatkov | Področje | Leto |
---|
Povezave do osebnih bibliografij avtorjev | Povezave do podatkov o raziskovalcih v sistemu SICRIS |
---|---|
Cvelbar, Uroš, 1975- | 22289 |
Vir: Osebne bibliografije
in: SICRIS
Izberite prevzemno mesto:
Prevzem gradiva po pošti
Naslov za dostavo:
Med podatki člana manjka naslov.
Storitev za pridobivanje naslova trenutno ni dostopna, prosimo, poskusite še enkrat.
S klikom na gumb "V redu" boste potrdili zgoraj izbrano prevzemno mesto in dokončali postopek rezervacije.
S klikom na gumb "V redu" boste potrdili zgoraj izbrano prevzemno mesto in naslov za dostavo ter dokončali postopek rezervacije.
S klikom na gumb "V redu" boste potrdili zgoraj izbrani naslov za dostavo in dokončali postopek rezervacije.
Obvestilo
Trenutno je storitev za avtomatsko prijavo in rezervacijo nedostopna. Gradivo lahko rezervirate sami na portalu Biblos ali ponovno poskusite tukaj kasneje.
Gesla v Splošnem geslovniku COBISS
Izbira mesta prevzema
Gradivo iz matične enote je brezplačno. Če je gradivo na mesto prevzema dostavljeno iz drugih enot, lahko knjižnica to storitev zaračuna.
Mesto prevzema | Status gradiva | Rezervacija |
---|
Rezervacija v teku
Prosimo, počakajte trenutek.
Rezervacija je uspela.
Rezervacija ni uspela.
Rezervacija...
Članska izkaznica:
Mesto prevzema: