E-viri
Recenzirano
Odprti dostop
-
Liu, Liyuan; Zschiesche, Hannes; Antonietti, Markus; Gibilaro, Mathieu; Chamelot, Pierre; Massot, Laurent; Rozier, Patrick; Taberna, Pierre‐Louis; Simon, Patrice
Advanced energy materials, 02/2023, Letnik: 13, Številka: 7Journal Article
MXenes, a rapidly growing family of 2D transition metal carbides, carbonitrides, and nitrides, are one of the most promising high‐rate electrode materials for energy storage. Despite the significant progress achieved, the MXene synthesis process is still burdensome, involving several procedures including preparation of MAX, etching of MAX to MXene, and delamination. Here, a one‐pot molten salt electrochemical etching (E) method is proposed to achieve Ti2C MXene directly from elemental substances (Ti, Al, and C), which greatly simplifies the preparation process. In this work, different carbon sources, such as carbon nanotubes (CNT) and reduced graphene oxide (rGO), are reacted with Ti and Al micro‐powders to prepare Ti2AlC MAX with 1D and 2D tuned morphology followed by in situ electrochemical etching from Ti2AlC MAX to Ti2CTx MXene in low‐cost LiCl‐KCl. The introduction of the O surface group via further ammonium persulfate (APS) treatment can act in concert with Cl termination to activate the pseudocapacitive redox reaction of Ti2CClyOz in the non‐aqueous electrolyte, resulting in a Li+ storage capacity of up to 857 C g−1 (240 mAh g−1) with a high rate (86 mAh g−1 at 120 C) capability, which makes it promising for use as an anode material for fast‐charging batteries or hybrid devices in a non‐aqueous energy storage application. A one‐pot molten salt electrochemical etching (E) method is proposed to achieve Ti2C MXene directly from elemental substances (Ti, Al, and C), which greatly simplifies the preparation process. By using carbon sources with different morphologies, such as carbon nanotubes and reduced graphene oxide, MAX and MXene with tuned morphology are prepared based on the “carbon‐template‐growth” mechanism.
Vnos na polico
Trajna povezava
- URL:
Faktor vpliva
Dostop do baze podatkov JCR je dovoljen samo uporabnikom iz Slovenije. Vaš trenutni IP-naslov ni na seznamu dovoljenih za dostop, zato je potrebna avtentikacija z ustreznim računom AAI.
Leto | Faktor vpliva | Izdaja | Kategorija | Razvrstitev | ||||
---|---|---|---|---|---|---|---|---|
JCR | SNIP | JCR | SNIP | JCR | SNIP | JCR | SNIP |
Baze podatkov, v katerih je revija indeksirana
Ime baze podatkov | Področje | Leto |
---|
Povezave do osebnih bibliografij avtorjev | Povezave do podatkov o raziskovalcih v sistemu SICRIS |
---|
Vir: Osebne bibliografije
in: SICRIS
To gradivo vam je dostopno v celotnem besedilu. Če kljub temu želite naročiti gradivo, kliknite gumb Nadaljuj.