E-viri
Recenzirano
Odprti dostop
-
Panzeri, Gabriele; Accogli, Alessandra; Gibertini, Eugenio; Varotto, Sara; Rinaldi, Christian; Nobili, Luca; Magagnin, Luca
Electrochemistry communications, 06/2019, Letnik: 103Journal Article
Ethylene glycol-based solutions containing metal precursor chloride salts were investigated for the electrodeposition of cobalt thin films and nanowires. The electrochemical behavior of 0.5 M Co(II) chloride solution at 70 °C was studied by means of cyclic voltammetry (CV) on a Pt substrate. The reduction process was shown to be irreversible, with high faradaic efficiencies (85–90 %). A diffusion coefficient (D0) of 2.29 × 10−6 cm2 s−1 for the Co species was estimated from the electrochemical behavior at different scan rates (from 25 to 125 mV s−1). The electrodeposition process was also studied on a copper substrate at different cathodic potentials (from −0.75 V vs Pt to −0.95 V vs Pt). Field-emission scanning electron microscopy (FE-SEM) and electron dispersive spectroscopy (EDS) revealed high-purity, compact films. Template-assisted electrodeposition resulted in ~16–18 μm long cobalt nanowires with an aspect ratio L/D > 100. X-ray diffraction (XRD) analysis of Co thin films showed a preferential orientation along the HCP 100 direction, which was even more marked for the nanowires. Vibrating sample magnetometry (VSM) highlighted that the fact that Co thin films were magnetized in-plane, while in nanowires a competition between shape and magnetocrystalline anisotropy led to similar magnetic behavior for the in-plane and out-of-plane directions. •Ethylene glycol is an effective solvent for the electrodeposition of cobalt.•Diffusion coefficient of cobalt ions is measured using the Randles-Sevcik equation.•Diffusivity of cobalt ions is higher than that in other organic solvents.•The magnetization of cobalt thin films preferentially lies in the film plane.•Cobalt nanowires show no magnetic anisotropy.
![loading ... loading ...](themes/default/img/ajax-loading.gif)
Vnos na polico
Trajna povezava
- URL:
Faktor vpliva
Dostop do baze podatkov JCR je dovoljen samo uporabnikom iz Slovenije. Vaš trenutni IP-naslov ni na seznamu dovoljenih za dostop, zato je potrebna avtentikacija z ustreznim računom AAI.
Leto | Faktor vpliva | Izdaja | Kategorija | Razvrstitev | ||||
---|---|---|---|---|---|---|---|---|
JCR | SNIP | JCR | SNIP | JCR | SNIP | JCR | SNIP |
Baze podatkov, v katerih je revija indeksirana
Ime baze podatkov | Področje | Leto |
---|
Povezave do osebnih bibliografij avtorjev | Povezave do podatkov o raziskovalcih v sistemu SICRIS |
---|
Vir: Osebne bibliografije
in: SICRIS
To gradivo vam je dostopno v celotnem besedilu. Če kljub temu želite naročiti gradivo, kliknite gumb Nadaljuj.