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Blagojevic, B; Bigot, Eric-Olivier Le; Fahy, K; Aguilar, A; Makonyi, K; Takács, E; Tan, J. N; Pomeroy, J. M; Burnett, J. H; Gillaspy, J. D; Roberts, J. R
08/2005Journal Article
Review of Scientific Instruments 76 (2005) 083102 A custom, flat field, extreme ultraviolet EUV spectrometer built specifically for use with low power light sources that operate under ultrahigh vacuum conditions is reported. The spectral range of the spectrometer extends from 4 nm to 40 nm. The instrument optimizes the light gathering power and signal to noise ratio while achieving good resolution. A detailed description of the spectrometer and design considerations are presented, as well as a novel procedure that could be used to obtain a synthetic wavelength calibration with the aid of only a single known spectral feature. This synthetic wavelength calibration is compared to a standard wavelength calibration obtained from previously reported spectral lines of Xe, Ar and Ne ions recorded with this spectrometer.
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Leto | Faktor vpliva | Izdaja | Kategorija | Razvrstitev | ||||
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JCR | SNIP | JCR | SNIP | JCR | SNIP | JCR | SNIP |
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Povezave do osebnih bibliografij avtorjev | Povezave do podatkov o raziskovalcih v sistemu SICRIS |
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Vir: Osebne bibliografije
in: SICRIS
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