E-resources
Peer reviewed
-
Xu, Ting; Fang, Liang; Zeng, Beibei; Liu, Yao; Wang, Changtao; Feng, Qin; Luo, Xiangang
Journal of optics. A, Pure and applied optics, 08/2009, Volume: 11, Issue: 8Journal Article
A subwavelength nanolithography technique based on unidirectional excitation of surface plasmons is proposed and numerically demonstrated by finite-difference time-domain analysis. Normal incident light impinging on a specially designed mask can excite two unidirectional surface plasmon waves (SPWs) with counter propagating directions on the unilluminated side. The simulation results show that the interference of these face-to-face SPWs launched by the mask could deliver about 50 nm half-pitch patterns at the operating wavelength of 365 nm, going far beyond the free space diffraction limit. This technique provides an effective fabrication method for nanostructures.
Author
Shelf entry
Permalink
- URL:
Impact factor
Access to the JCR database is permitted only to users from Slovenia. Your current IP address is not on the list of IP addresses with access permission, and authentication with the relevant AAI accout is required.
Year | Impact factor | Edition | Category | Classification | ||||
---|---|---|---|---|---|---|---|---|
JCR | SNIP | JCR | SNIP | JCR | SNIP | JCR | SNIP |
Select the library membership card:
If the library membership card is not in the list,
add a new one.
DRS, in which the journal is indexed
Database name | Field | Year |
---|
Links to authors' personal bibliographies | Links to information on researchers in the SICRIS system |
---|
Source: Personal bibliographies
and: SICRIS
The material is available in full text. If you wish to order the material anyway, click the Continue button.